付永启, 赵兴国. 极小刻划间隙下的衍射光强度变化规律分析[J]. 光学精密工程, 1996,(3): 91-94

Fu Yongqi, Zhao Xingguo. Analysis or Diffraction Intensity Changing Ruling under Extreme Small Lithography Gap[J]. Editorial Office of Optics and Precision Engineering, 1996,(3): 91-94

付永启, 赵兴国. 极小刻划间隙下的衍射光强度变化规律分析[J]. 光学精密工程, 1996,(3): 91-94 DOI：

Fu Yongqi, Zhao Xingguo. Analysis or Diffraction Intensity Changing Ruling under Extreme Small Lithography Gap[J]. Editorial Office of Optics and Precision Engineering, 1996,(3): 91-94 DOI：