WANG Zhan-Shan . The Analysis of Multilayer Waveband Matching for Schwarzschild Objective Working at 18.2nm[J]. Editorial Office of Optics and Precision Engineering, 1999,(3): 14-18
WANG Zhan-Shan . The Analysis of Multilayer Waveband Matching for Schwarzschild Objective Working at 18.2nm[J]. Editorial Office of Optics and Precision Engineering, 1999,(3): 14-18DOI:
The developments of multilayers make normal incidence imaging systems with high resolution from wavelength range of infrared
visible and ultraviolet to soft X-ray. The Schwarzschild objective which consists of two concentric mirrors is extensively used in soft X-ray range because the reflectivity of multilayers is lower than that in other range. Combining the waveband matching condition with the configuration of Schwarzschild objective and performance of magnetron sputtering instrument
the multilayer coating process is analyzed for completing fabrication of multilayers using in 18.2nm Schwarzschild objective. The theoretic suggestion is supplied for making multilayers meeting with waveband matching condition.