弧矢聚焦双晶单色器聚焦误差分析

傅翾; 周仁魁; 周泗忠; 夏绍建

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弧矢聚焦双晶单色器聚焦误差分析

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- 弧矢聚焦双晶单色器聚焦误差分析
- Analysis of the focusing error of sagittally focusing double-crystal monochromator
- 光学精密工程 2001年9卷第3期页码：230-233
- 作者机构：
  
  1. 中国科学院西安光学精密机械研究所, 陕西西安, 710068
  2. 国家上海同步辐射中心上海,201800
- 作者简介：
- 基金信息：
  
  "上海光源工程”光束线站预研项目,国家"十五”重点攻关项目.计科技[1998]289号()
- DOI：
  中图分类号： TH744.1
- 收稿日期：2001-01-04，
  
  修回日期：2001-03-07，
  
  网络出版日期：2001-06-15，
  
  纸质出版日期：2001-06-15
- 稿件说明：
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傅翾, 周仁魁, 周泗忠, 夏绍建. 弧矢聚焦双晶单色器聚焦误差分析[J]. 光学精密工程, 2001,(3): 230-233

FU Xuan, ZHOU Ren-kui, ZHOU Si-zhong, XIA Shao-jian . Analysis of the focusing error of sagittally focusing double-crystal monochromator[J]. Editorial Office of Optics and Precision Engineering, 2001,(3): 230-233
傅翾, 周仁魁, 周泗忠, 夏绍建. 弧矢聚焦双晶单色器聚焦误差分析[J]. 光学精密工程, 2001,(3): 230-233 DOI：

FU Xuan, ZHOU Ren-kui, ZHOU Si-zhong, XIA Shao-jian . Analysis of the focusing error of sagittally focusing double-crystal monochromator[J]. Editorial Office of Optics and Precision Engineering, 2001,(3): 230-233 DOI：

摘要

简单介绍了弧矢聚焦单色仪的分光原理及结构原理

分析了同步辐射弧矢聚焦双晶单色器实际转轴偏离理想转轴Δ

及晶面偏离与导轨的理想夹角Δα对出射光高度的影响

并对弧矢聚焦晶体压弯半径的压弯精度Δ

对实验站聚焦光斑展宽的作用进行了理论推导.当Δ

≤31μm、Δα≤1′

就可以确保出射光线高度误差Δ

≤25μm;当对称压弯第二晶体所需微位移器的行程≥1mm、精度≤1.25μm时

可满足聚焦光斑的展宽≤0.5mm要求

且当压弯半径

的弯曲精度在Δ

≤0.75%R的范围内不需对晶体压弯.

Abstract

The paper briefly introduces the monochromatic and structure principles

and also analyses the height error of the reflective beam of the monochromator in synchrotron radiation

which is decided by what the rotational axis and the angle between the diffracting surface of crystal and the slide depart from the theoretical position

and gets the relation between the width of the facula focused and the driving precision of the bender

offering the theoretical base for the installment and movement of the two crystals.When Δ

≤31μm、Δα≤1′

height error of the reflected beam is Δ

≤25μm

when the travel of micropositioner is more than 1mm

the precision is less than 1.25μm and the width of the facula focused is less than 0.5mm

and when Δ

≤0.75%R(

is the curved radius of crystal)

the crystal may not be beat.

关键词

Keywords

references

Steve M.HEALD. Focusing X-ray monochromator for EXAFS studies in the energy range 4keV～3keV[J]. Nucl. Instrum. Methods, 1984, 222(1): 160-163.

Sparks C J, et al. X-ray monochromator geometry for focusing synchrotron radiation above 10keV[J]. Nucl. Instrum. Methods,1980, 172(1): 237-242.

Sparks C J,et al. Sagittal focusing of synchrotron X-radiation with curved crystals[J]. Nucl. Instrum. Methods,1982, 194(1): 73-78.

Ice C E, et al. Focusing optics a synchrotron X-radiation microprobe[J]. Nucl. Instrum. Methods, 1984, 222(1): 121-127.

Matsushita T, et al. Sagittally focusing double-crystal monochromator with constant exit beam height at the photo factory[J]. Nucl. Instrum. Methods, 1986,A246(1): 137-139.

Bernstorff S, et al. Fixed-exit double-crystal monochromator for the diffraction beamline at ELETTRA: A new concept for crystal movements[J]. Rev. Sci. Instrum,1995, 66(2): 2065-2068.

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