Synchrotron Radiation Lithography and MEMS Technique at NSRL
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Synchrotron Radiation Lithography and MEMS Technique at NSRL
Synchrotron Radiation Lithography and MEMS Technique at NSRL
光学精密工程2001年9卷第5期 页码:455-457
作者机构:
National Synchrotron Radiation Laboratory, University of Science and Technology of China Hefei,China,230029
作者简介:
基金信息:
DOI:
中图分类号:TL544
收稿日期:2001-08-29,
修回日期:2001-09-25,
网络出版日期:2001-10-15,
纸质出版日期:2001-10-15
稿件说明:
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LIU Gang, TIAN Yang-chao . Synchrotron Radiation Lithography and MEMS Technique at NSRL[J]. 光学精密工程, 2001,(5): 455-457
LIU Gang, TIAN Yang-chao . Synchrotron Radiation Lithography and MEMS Technique at NSRL[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 455-457
LIU Gang, TIAN Yang-chao . Synchrotron Radiation Lithography and MEMS Technique at NSRL[J]. 光学精密工程, 2001,(5): 455-457DOI:
LIU Gang, TIAN Yang-chao . Synchrotron Radiation Lithography and MEMS Technique at NSRL[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 455-457DOI:
Synchrotron Radiation Lithography and MEMS Technique at NSRL
Two beamlines and stations for soft X-ray lithography and hard X-ray lithography at NSRL are presented. Synchrotron radiation lithography (SRL) and mask techniques are developed
and the micro-electro-mechanical systems (MEMS) techniques are also investigated at NSRL. In this paper
some results based on SRL and MEMS techniques are reported
and sub-micron and high aspect ratio microstructures are given. Some micro-devices
such as microreactors are fabricated at NSRL.
Abstract
Two beamlines and stations for soft X-ray lithography and hard X-ray lithography at NSRL are presented. Synchrotron radiation lithography (SRL) and mask techniques are developed
and the micro-electro-mechanical systems (MEMS) techniques are also investigated at NSRL. In this paper
some results based on SRL and MEMS techniques are reported
and sub-micron and high aspect ratio microstructures are given. Some micro-devices