
浏览全部资源
扫码关注微信
1. 北京航空材料研究院, 先进复合材料国防科技重点实验室 北京,100095
2. 二炮北京军代局 北京,100083
3. 二炮驻699厂军代室 北京,100083
收稿日期:2001-10-16,
修回日期:2002-07-22,
网络出版日期:2002-10-15,
纸质出版日期:2002-10-15
移动端阅览
梁龙, 吴斌, 杨德军. 厚度效应对Pb(Zr<SUB>0.53</SUB>Ti<SUB>0.47</SUB>)O<SUB>3</SUB>薄膜微结构、铁电、介电性能的影响[J]. 光学精密工程, 2002,(5): 523-527
LIANG Long, WU Bin, YANG De-jun. Thickness effects on the microstructure, ferroelectric and dielectric properties of highly (111) oriented Pb(Zr<SUB>0.53</SUB> Ti<SUB>0.47</SUB>)O<SUB>3</SUB> thin films[J]. Editorial Office of Optics and Precision Engineering, 2002,(5): 523-527
梁龙, 吴斌, 杨德军. 厚度效应对Pb(Zr<SUB>0.53</SUB>Ti<SUB>0.47</SUB>)O<SUB>3</SUB>薄膜微结构、铁电、介电性能的影响[J]. 光学精密工程, 2002,(5): 523-527 DOI:
LIANG Long, WU Bin, YANG De-jun. Thickness effects on the microstructure, ferroelectric and dielectric properties of highly (111) oriented Pb(Zr<SUB>0.53</SUB> Ti<SUB>0.47</SUB>)O<SUB>3</SUB> thin films[J]. Editorial Office of Optics and Precision Engineering, 2002,(5): 523-527 DOI:
用改进的溶胶-凝胶法在Pt(111)/Ti/SiO
2
/Si(100)衬底上制备了不同厚度的高度(111)取向的Pb(Zr
0.53
Ti
0.47
)O
3
薄膜.运用X射线衍射(XRD)和原子力显微镜(AFM)分析了薄膜的微结构
原子力显微镜表明厚度为0.3μm和0.56μm的PZT薄膜的晶粒尺寸和表面粗糙度分别为0.2~0.3μm、2~3μm和0.92nm、34nm.0.3μm和0.56μm PZT薄膜的剩余极化(Pr)和矫顽场(Ec)分别为32.2μC/
2
、79.9kV/cm
27.7μC/cm
2
、54.4kV/cm;在频率100KHz时
薄膜的介电常数和介电损耗分别为539、0.066
821、0.029.
Lead zirconate titanate Pb(Zr
0.53
Ti
0.47
)O
3
(PZT) ferroelectric thin films with various thickness were grown on Pt(111)/Ti/SiO
2
/Si(100) substrates by a simple sol-gel process
without reflux or high temperature distillation to remove water. The thin films were annealed at 550~600℃ in oxygen atmosphere by rapid thermal annealing (RTA)
the highly (111)-oriented PZT thin films have been obtained. The microstructure and surface morphologies of the thin films have been studied by X-ray diffraction (XRD) and the atomic force microscopy(AFM). AFM images show that the grain thickness and RMS roughness of the highly(111) oriented PZT thin films with thickness of 0.3 and 0.56μm are 0.2~0.3μm
2~3μm and 0.92nm
34nm
respectively. The remanent polarization (Pr) and coercive electric field (Ec) are 32.2μC/cm
2
and 79.9kV/cm
27.7μC/cm
2
and 54.4 kV/cm; at 100kHz
the dielectric constant and dissipation factor are 539 and 0.066
821 and 0.029
respectively.
Scott J F. High dielectric constant thin films for dynamic random access memories[J] .Ferroelectrics Reviews,1998,1:1-5.
Polla D L, Francis L F. Processing and characterization of piezoelectric materials and integration into micro-electromechaical systems[J] .Annu. Rev. Mater. Sci, 1998,28:563-568.
Polla D L, Francis L F.Ferroelectric thin films in micro-electromechanical systems[J] . MRS. Bull,1996,21:59-64.
Sun C L, Chen S Y, Tang M Y,et al. Characteristc of Pb(Zr0.53Ti0.47)O3 on metal and Al2O3/Si substrates[J] .J. Electrochem. Soc,2001,148:203-206.
Yang Y S, Lee S J, Yi S, et al. Schottky barriers effects in the photocurrent of sol-gel derived lead zirconate titanate thin films[J] .App. Phys.Lett,2000,76:774-784.
Brook K G, Reaney I M, Klissurska R, et al. Orientation of rapid thermally annealed lead zirconate titanate thin films on(111) Pt substrates[J] .J. Mater. Res,1994,9:2540.
Lee J Y,Lee B S. Orientation control and electrical properties of sputtered Pb(Zr,Ti)O3 films[J] .Mate .Sci. and Eng,2001,79:86-91.
Husmann A, Wesner D A, Schmidt J,et al. Pulsed laser depostion of crystalline PZT thin films[J] . Surf. Coat. Technol,1997,97:420.
Kim D-H, Na J S, Rhee S-W. J. Metallogranic chemical vapor deposition of Pb(Zr,Ti)O3 film s using a single mixture of metallogranic precursors[J] .Electrochem. Soc.2001,148:668-676.
Tang X G, Ding A L, Ye Y, et al. Structure and properties of Pb(Ca,Ti)O3 thin films derived by sol-gel process[J] .Ferroelectrics,2001,264: 297-303.
Kwok C K,Desu S B. Low temperature perovskite formation of lead zirconate titanate thin films by a seeding process[J] . J. Mater. Res,1993,8:339-343.
Xu B M, Ye Y H, Cross L E. Dielectric hystereis from transverse electric fields in lead zirconate titante thin films[J] .Appl. Phys. Lett,1999,74:3549-3554.
Chen S Y, Chen I W. Temperature-tim texture transition of Pb(Zr,Ti)O3 thin films:1,role of Pb-rich intermedicate phse[J] .J. Am. Ceram. Soc,1994,77:2332-2338.
Huang Z, Zhang Q, Whatmore R W. The role of an intermetallic phase on the crystallization of lead zirconate titanate in sol-gel process[J] . J. Mater. Sci. Lett,1998,17:1157-1166.
Hung Z, Zhang Q, Whatmore R W.Low temperature crystallization of lead zirconate titanate thin films by a sol-gel method[J] . J. Appl. Phys,1999,85:7355-7359.
0
浏览量
549
下载量
1
CSCD
关联资源
相关文章
相关作者
相关机构
京公网安备11010802024621