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中国科学院光电技术研究所, 微细加工光学技术国家重点实验室,四川 成都,610209
收稿日期:2002-10-17,
修回日期:2002-12-25,
网络出版日期:2003-02-15,
纸质出版日期:2003-02-15
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陈献忠, 高洪涛, 姚汉民, 陈旭南, 李展, 石建平, 陈元培. 用亚稳态氩原子束制作纳米结构[J]. 光学精密工程, 2003,(1): 6-10
CHEN Xian-zhong, GAO Hong-tao, YAO Han-min, CHEN Xu-nan, LI Zhan, SHI Jian-ping, CHEN Yuan-pei. Using metastable argon atomic beam to fabricate nanostructures[J]. Editorial Office of Optics and Precision Engineering, 2003,(1): 6-10
陈献忠, 高洪涛, 姚汉民, 陈旭南, 李展, 石建平, 陈元培. 用亚稳态氩原子束制作纳米结构[J]. 光学精密工程, 2003,(1): 6-10 DOI:
CHEN Xian-zhong, GAO Hong-tao, YAO Han-min, CHEN Xu-nan, LI Zhan, SHI Jian-ping, CHEN Yuan-pei. Using metastable argon atomic beam to fabricate nanostructures[J]. Editorial Office of Optics and Precision Engineering, 2003,(1): 6-10 DOI:
纳米结构制作是纳米技术的重要组成部分
原子光刻技术是纳米图形制作的一项新方法.对直流高压放电产生的亚稳态氩原子束进行准直减小其发散角
亚稳态原子在与之传播方向垂直的激光驻波场中发生淬火并沉积在基底上
破坏吸附在基底表面的SAM膜(self_assembled monolayers)
结合刻蚀技术可制作出纳米量级的图形.给出该技术制作纳米图形的基本原理、方案、相关理论及模拟结果.
Fabrication of nanostructures is an important part of nanotechnology
and atom li thography technology is a new nanostructure fabrication method. A me tastable a rgon atomic beam generated by high-voltage discharge is collimated to minimize t he divergence angle of atomic beam.Metastable atoms are quenched when well-c ollimated beam travels through the light standing wave perpendicular to the prop agation direction of the atomic beam
and then deposited onto the substrate. SAM abso rbed on substrate surface is damaged by metastable atoms
and the nanometer-scale structure can be fabricated with etching technologies. The basic principle
expe rimental schemes
correlative theory of this technique and simulation results are given.
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罗先刚.原子光刻技术探索研究[D].成都:中国科学院光电技术研究所,2001.LUO X G. Study on atom lighography, doctoral dissertation[D]. Chengdu:Institute of Optics and Electronics, Chinese Academy of Sciences. Chengdu,2001.(in Chinese)
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