原子力显微镜(AFM)在光盘检测及其质量控制中的应用

景蔚萱; 蒋庄德

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原子力显微镜(AFM)在光盘检测及其质量控制中的应用

测试技术及设备 | 更新时间：2020-08-12

- 原子力显微镜(AFM)在光盘检测及其质量控制中的应用
- Measurement and quality control of optical discs with atomic force microscope (AFM)
- 光学精密工程 2003年11卷第4期页码：368-373
- 作者机构：
  
  西安交通大学, 精密工程研究所, 陕西, 西安, 710049
- 作者简介：
- 基金信息：
  
  国家教育部博士点基金项目(No.1999069821)();高等学校骨干教师资助计划项目()
- DOI：
  中图分类号： TP212
- 收稿日期：2003-01-16，
  
  修回日期：2003-02-19，
  
  网络出版日期：2003-08-15，
  
  纸质出版日期：2003-08-15
- 稿件说明：
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景蔚萱, 蒋庄德. 原子力显微镜(AFM)在光盘检测及其质量控制中的应用[J]. 光学精密工程, 2003,(4): 368-373

JING Wei-xuan, JIANG Zhuang-de. Measurement and quality control of optical discs with atomic force microscope (AFM)[J]. Editorial Office of Optics and Precision Engineering, 2003,(4): 368-373
景蔚萱, 蒋庄德. 原子力显微镜(AFM)在光盘检测及其质量控制中的应用[J]. 光学精密工程, 2003,(4): 368-373 DOI：

JING Wei-xuan, JIANG Zhuang-de. Measurement and quality control of optical discs with atomic force microscope (AFM)[J]. Editorial Office of Optics and Precision Engineering, 2003,(4): 368-373 DOI：

摘要

综述了原子力显微镜(AFM)在光盘质量检测中的应用.AFM能够在nm尺度上直接对光盘及其模板上的信息位几何结构的特征尺寸及其误差进行三维测量

从而可以建立生产工艺参数和信息位几何结构之间、信息位几何结构和盘片电气性能之间的关系

进而找出影响光盘质量的直接原因.用AFM进行光盘质量检测主要有三方面：盘片和模板表面的定性观测;信息位几何结构的半定量分析;信息位特征尺寸的统计分析.定性观测和半定量分析可以对盘片播放的高误差率、凹坑形态和块出错率、凸台形态及其表面粗糙度等参数进行有针对性的检测;而信息位特征尺寸的统计分析则可以对信息位几何结构的关键参数进行面向生产过程的统计分析.所得结论表明AFM在光盘质量检测过程中具有独特的优势.

Abstract

Applications of Atomic Force Microscopy (AFM) in optical disc technology are summarized. AFM is ideally suited to the characterization of nanometer scale pit and bump structures in CD/DVD manufacturing

so the relationship between production variables and pits/bumps geometry as well as relations between pits/bumps geometry and electrical performance of discs can be established to perform direct quality control of CD/DVD manufacturing. Applications of AFM in optical disc technology mainly fall into three parts: qualitative analysis of topography of discs/stampers

semi quantitative analysis of pits/bumps geometry of discs/stampers and length analysis of data marks on bump with statistics technology. Qualitative analysis of topography of discs/stampers and semi quantitative analysis of pits/bumps geometry of discs/stampers are chiefly oriented to the measurements of high error rate at beginning of play

pit morphology and block error rate

track pitch variations

pit depth monitoring as well as bump morphology and its surface roughness. It is discovered that the efficiency of the cooling channels of the mold has deteriorated

resulting in the discs being separated from the stamper while they are too soft due to inadequate cooling in the area where high error rate and block error rate are frequently produced. Length analysis of data marks with statistics technology is aimed at the analysis of track pitch and pitch variation

bump length (offset

deviation

asymmetry) and AFM jitter

bump width and width variation

bump height and height variation as well as side wall angle (slope) and slope variation. Statistical analysis of AFM images yields important information about optical disc microstructure and in turn provides information about the performance of the manufacturing process. It is very useful to analyze geometric parameters by considering the fundamental length groups of the data marks. The obtained results demonstrate that AFM have particular advantages in the quality control of discs/stampers manufacturing.

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references

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