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1. 大连理工大学, 电子与信息工程学院,辽宁 大连,116024
2. 大连海事大学, 电子与信息工程学院, 辽宁, 大连, 116026
收稿日期:2004-03-14,
修回日期:2004-06-15,
网络出版日期:2004-08-15,
纸质出版日期:2004-08-15
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胡家升, 宋利民. 软X射线多层膜设计中表面粗糙度对反射率的影响[J]. 光学精密工程, 2004,(4): 380-385
HU Jia-sheng, SONG Li-min. Roughness effects on the reflectance in the design of a soft X-ray multi-layer mirror[J]. Editorial Office of Optics and Precision Engineering, 2004,(4): 380-385
给出了一种改进的软X射线波段的多层膜设计方法.在设计过程中
考虑了反射镜基底和各膜层之间的均方(RMS)粗糙度对反射率的影响 ;在Stearns提出的散射理论的基础上给出了粗糙界面的数学模型.文中以波长为λ=1.03nm的软X射线为例进行设计
设计结果表明 :要使波长为λ=1.03nm的多层膜的反射率大于10%
反射镜基底的均方粗糙度不应超过0.6nm.实验中选择几块表面粗糙度为 0.5nm(RMS)的熔石英平面镜作为基底来制作适用于该波长的、层对数超过70的多层膜.然后在的入射角下测量反射率
测得的值为10%
这与采用本设计方法得到的计算结果一致.该反射镜作为X射线谱仪的分光元件被应用于惯性约束聚变(ICF)的过程诊断中.
In the design of a multi-layer mirror at λ=1.03 nm in soft X-ray regin
a modified method is presented
in which the effects of root-mean-square(rms)roughness of the substrate and interfaces between these films on the reflectance are considered and discussed. Then
the mathematical model for rough interfaces is given based on the scattering theory presented by D. G. Stearns. The design result shows that the substrate roughness(rms)should be smaller than 0.6 nm in order to fabricate a multi-layer mirror whose reflectance is greater than 10%. A few super-polished fused quartz substrates with 0.5 nm(rms)roughness are chosen in coating experiments. The measured reflectance is about 10% at λ=1.03 nm
which is consistent with the result acquired by the modified design method. The multi-layer mirror has been applied in a X-ray spectrograph for diagnosis of inertial confinement fusion(ICF).
ERCAN A E,SINN H,ALA TAS A,et al.Source and optics considerations for new generation high2resolution inelastic
X2ray spectrometers[J].N uclear Inst ruments and Methods in Physics Research Section A,2001,4672468:6172622.
WEI P,XU Y,NARUM I K,et al.Structure and optical properties of Ge/C multilayers deposited on Si and Sapphire
substrates by RF magnetron sputtering[J].O ptical M aterials,2003,23:122,83287.
PAPARAZZO E,MORETTO L.Surface and interface microchemistry of archaeological objects studied wit h X2ray pho2
toemission spectroscopy and scanning auger microscopy[J].Journal of Elect ron S pect roscopy and Related Phenomena,
1995,76:6532658.
WAL KER A B C.The ultra high resolution XUV Spectroheliograph[J].O pt.Eng.,1990,29:92296.
STEARNS D G,ROSEN R S,V ERM EN S P.Multilayer mirror technology for soft x tay projection lit hography[J].A p2
pl.O pt.,1993,32:6952
26960.
UNDERWOOD J H,J R B,ARB EE T W.Layered synt hetic microstructures as Bragg diffractors for X2rays and extreme
ultraviolet;t heory and predicted performance[J].A ppl.O pt.,1981,20(17):302723034.
HEN KE B L,GULL I KSON E M,DAV IS J C.X2ray interactions:photabsorption,scattering,transmission,and reflec2
tion at E250230000 eV,Z=1292[J].A tom ic Data and N uclear Tables,1993,54:1812343.
STEARNS D G.The scattering of X2ray from no2ideal multi2player structures[J].J.A ppl.Phys.,1989,65:4912506.
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