水靶激光等离子体光源11~20 nm波段光谱实验

齐立红; 李忠芳; 尼启良; 陈 波

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水靶激光等离子体光源11~20 nm波段光谱实验

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- 水靶激光等离子体光源11~20 nm波段光谱实验
- Experimental study of the spectrum at 11~20 nm of a laser-produced plasma source using water target
- 光学精密工程 2005年13卷第3期页码：272-275
- 作者机构：
  
  1. 中国科学院研究生院,北京 100039
  2. 中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春,130033
  3. 吉林大学原子与分子物理研究所,吉林长春 130026
- 作者简介：
- 基金信息：
- DOI：
  中图分类号： O433.1
- 收稿日期：2005-02-22，
  
  修回日期：2005-03-18，
  
  网络出版日期：2005-06-30，
  
  纸质出版日期：2005-06-30
- 稿件说明：
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齐立红, 李忠芳, 尼启良, 等. 水靶激光等离子体光源11~20 nm波段光谱实验[J]. 光学精密工程, 2005,13(3):272-275.

QI Li-hong, LI Zhong-fang, NI Qi-liang, et al. Experimental study of the spectrum at 11~20 nm of a laser-produced plasma source using water target[J]. Optics and precision engineering, 2005, 13(3): 272-275.
齐立红, 李忠芳, 尼启良, 等. 水靶激光等离子体光源11~20 nm波段光谱实验[J]. 光学精密工程, 2005,13(3):272-275. DOI：

QI Li-hong, LI Zhong-fang, NI Qi-liang, et al. Experimental study of the spectrum at 11~20 nm of a laser-produced plasma source using water target[J]. Optics and precision engineering, 2005, 13(3): 272-275. DOI：

摘要

实验以水为靶材

Nd:YAG激光器为照射激光构成激光等离子体光源

产生软X射线-极紫外辐射。利用McPHERSON 247型掠入射软X射线-真空紫外单色仪、AXUV100硅光电二极管

测量了11~20 nm波段水靶激光等离子体光源的光谱。实验表明

在11~20 nm波段水靶激光等离子体光源存在多条线谱

均由水中氧离子电子跃迁产生。所用单色仪光谱分辨率Δλ≤0.075 nm

波长扫描间隔0.5 nm。另外

采用在喷嘴处加热的办法

很好地解决了水进入真空系统后绝热膨胀与蒸发过程中温度骤降而结冰的问题

有效地抑制了喷射距离缩短

克服了等离子体对喷嘴腐蚀严重的问题。

Abstract

A laser- produced plasma(LPP) source is built with water as target and a Nd:YAG laser as irradiate laser

the radiation of the LPP source at 11~20 nm is measured with an AXUV100 silicon photodiode combined with a McPHERSON model 247 grazing incidence monochromator

of which the monochromator resolution is

λ≤0.075 nm

and the wavelength scanning interval is 0.5 nm. The experimental result demonstrates that the water target LPP source has EUV emission at 11~20 nm wavelength

which are all generated from electronic transitions in oxygen ions. In addition

to solve the erosion problem caused by the short distance between the laser-water action point and the nozzle

the distance is lengthened by heating the nozzle to reduce the effect caused by the evaporation and the adiabatic expansion.

关键词

Keywords

references

. 尼启良. 液体微滴喷射靶激光等离子体软X射线源研究 . 中国科学院长春光学精密机械与物理研究所,2003. NI Q L. Study on laser-produced plasma soft X-ray source with liquid aerosol spray target .Thesis P D, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2003. (in Chinese)

. BJORN A M. HANSSON M B,OSCAR H G,et al.Xenon liquid-jet laser-plasma source for EUV lithography[J]. SPIE, 2000, 3997:729-732.

. MOCHIZUKI T,SHIMOURA A,AMANO S,et al.Compact high-average-power laser-plasma X-ray source by cryogenic targets[J]. SPIE, 2001,4504:87-96.

. LIN J Q,YASHIRO H,AOTA T,et al.EUV generation using water droplet target[J].SPIE, 2004,5374:906-911.

. VOGT U,STIEL H,WILL I. Scaling-up a liquid water jet laser plasma source to high average power for extreme ultraviolet lithography[J]. SPIE, 2001,4343:87-93.

. 曹继红,尼启良,陈波. 用Si光电二极管标定软X射线探测器[J]. 光学精密工程,2004,12 (1):118-121. CAO J H, NI Q L, CHEN B O. Calibration of soft X-ray detector[J]. Optics and Precision Engineering, 2004,12 (1):118-121.(in Chinese)

. 曹继红,尼启良,巩岩. 虚拟仪器实现极紫外波段光谱数据采集和处理[J]. 光学精密工程,2002,10(6增):103-106. CAO J H, NI Q L, GONG Y, et al. Data acquisition and processing in EUV with labview program[J]. Optics and Precision Engineering, 2002,10(6 suppl):103-106.(in Chinese)

. JIN F,RICHARDSON M. New laser plasma source for extreme-ultraviolet lithography[J]. Appl. Opt., 1995,34(25):5750-5760.

. JIN F,RICHARDSON M,SHIMKAVEG G,et al.Characterization of a laser plasma water droplet EUV source[J]. SPIE, 1995,2523:81-87.

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