Multilayer optics for the EUV and soft X-rays

Torsten Feigl; Sergiy Yulin; Nicolas Benoit; Norbert Kaiser

doi:null

您当前的位置：

首页 >

文章列表页 >

Multilayer optics for the EUV and soft X-rays

更新时间：2020-08-12

- Multilayer optics for the EUV and soft X-rays
- Multilayer optics for the EUV and soft X-rays
- 光学精密工程 2005年13卷第4期页码：421-429
- 作者机构：
  
  Fraunhofer Institut für Angewandte Optik und Feinmechanik, Albert-Einstein-Str. 7,- Jena D,Germany,07745
- 作者简介：
- 基金信息：
- DOI：
  中图分类号：
- 收稿日期：2005-06-06，
  
  修回日期：2005-06-16，
  
  网络出版日期：2005-08-30，
  
  纸质出版日期：2005-08-30
- 稿件说明：
移动端阅览
Torsten Feigl, Sergiy Yulin, Nicolas Benoit, 等. Multilayer optics for the EUV and soft X-rays[J]. 光学精密工程, 2005,13(4):421-429.

Torsten Feigl, Sergiy Yulin, Nicolas Benoit, et al. Multilayer optics for the EUV and soft X-rays[J]. Optics and precision engineering, 2005, 13(4): 421-429.
Torsten Feigl, Sergiy Yulin, Nicolas Benoit, 等. Multilayer optics for the EUV and soft X-rays[J]. 光学精密工程, 2005,13(4):421-429. DOI：

Torsten Feigl, Sergiy Yulin, Nicolas Benoit, et al. Multilayer optics for the EUV and soft X-rays[J]. Optics and precision engineering, 2005, 13(4): 421-429. DOI：

摘要

The demand to enhance the optical resolution

to structure and observe ever smaller details

has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography

optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (

=13.5 nm)

microscopy in the "water window" (

=2.3~4.4 nm)

astronomy (

=5~31 nm)

spectroscopy

plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si

Cr/Sc and Sc/Si multilayer optics.

Abstract

The demand to enhance the optical resolution

to structure and observe ever smaller details

has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography

=13.5 nm)

microscopy in the "water window" (

=2.3~4.4 nm)

astronomy (

=5~31 nm)

spectroscopy

Cr/Sc and Sc/Si multilayer optics.

关键词

Keywords

references

. D. Attwood.Soft X-rays and extreme ultraviolet radiation: principles and applications[M].Cambridge University Press, 2000.

. E.A. Dobisz (Edt.). Emerging lithographic technologies V[J]. Proc. SPIE,2001,4343:810. R.L. Engelstad (Edt.).EmergingLithographic Technologies VI[J].Proc. SPIE,2002,4688:443. R.L. Engelstad (Edt.).Emerging Lithographic Technologies VII[J].Proc. SPIE,2003,5037:590.

. K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, R. Lebert.Highly repetitive, extreme ultraviolet radiation source based on a gas-discharge plasma[J]. Appl. Opt.,1999,38:5413-5417.

. I.V. Kozhevnikov, I.N. Bukreeva, E. Ziegler. Design of X-ray supermirrors[J].Nucl. Instr. Meth. Phys. Res. A,2001,460:424- 443.

. P. B ni. Supermirror-based beam devices[J]. Physica,1997,B234-236:1038-1043.

. K.D. Joensen, P. Voutov, A. Szentgyorgyi, J. Roll, P. Gorenstein, P. Hoghoj, F.E. Christensen.Design of grazing incidence multilayer supermirrors for hard X-ray reflectors[J]. Appl. Optics,1995,34:7935-7944.

. Z. Wang, J. Cao, A.G. Michette.Depth-graded multilayer X-ray optics with broad angular response[J].Optics Communications,2000,177:25-32.

. V.V. Protopov, V.A. Kalnov.X-ray multilayer mirrors with an extended angular range[J]. Optics Communications,1998,158:127-140.

. B.L. Henke, E.M. Gullikson, J.C. Davis. X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-30000 eV, Z=1~92[J]. Atomic Data and Nuclear Data Tables,1993, 54(2):181-342.

. J. Thieme, G. Schmahl, D. Rudolph, E. Umbach,et al.X-Ray microscopy and spectromicroscopy . Springer Verlag, 1998.

. C. Jacobsen, J. Kirz, S. Williams.Resolution in soft X-ray microscopes[J]. Ultramicroscopy,1992,47:55-79.

. K. Murakami, T. Oshino, H. Nakamura, M. Ohtani, H. Nagata. Schwarzschild microscope for carbon Kα radiation[J]. Appl. Opt.,1993,32:7057-7061.

. K. Bergmann, G. Schriever, O. Rosier, M. M ler, W. Neff, R. Lebert. High repetitive, extrem-ultraviolet radiation source based on a gas-discharge plasma[J]. Appl. Opt.,1999,38:5413-5417.

. N.N. Salashchenko, E.A. Shamov. Short-period X-ray multilayers based on Cr/Sc[J]. Optics Communications,1997,134:7-10.

. F. Sch fers, H.C. Mertins, F. Schmolla, I. Packe, N.N. Salashchenko, E.A. Shamov: Cr/Sc multilayers for the soft X-ray range[J].Appl. Opt.,1998,37:719-728.

. Yu.A. Uspenskii, V.E. Levashov, A.V. Vinogradov, A.I. Fedorenko, V.V. Kondratenko, Yu.P. Pershin, E.N. Zubarev, V.Yu. Fedotov. High-reflectivity multilayer mirrors for a vacuum-ultraviolet interval of 35~50 nm[J].Optics Letters,1998,23:771-773.

. V.E. Levashov, Yu.A. Uspenskii, A.V. Vinogradov, A.I. Fedorenko, V.V. Kondratenko, Yu.P. Pershin, E.N. Zubarev, S. Mrowka, F. Schers. Sc-Si normal incidence mirrors for VUV interval of 35~50 nm[J]. Nuclear Instruments and methods in Phys. Res.,2000,448:147-151.

. J.J. Rocca, V. Shlyaptsev, F.G. Tomasel, O.D. Cortazar, D. Hartshorn, J.L.A. Chilla. Demonstration of a discharge pumped table-top soft-X-ray laser[J]. Phys. Rev. Letters,1994, 76:2192-2195.

. B.R. Benware, M. Seminario, A.L. Lecher, J.J. Rocca, Yu.A. Uspenskii, A.V. Vinogradov, V.V. Kondratenko, Yu.P. Pershin. Generation and application of a high-average-power polarized soft-X-ray laser beam[J].J. Opt. Sos. Am.,2001, B18:1041-1045.

. U. Teubner, G. Pretzler, Th. Schlegel, K. Eidmann, E. F rster, K. Witte. Anomalies in high-order harmonic generation at relativistic intensities[J]. Phys. Rev., 2004,A 67:013-816.

. D.L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E.M. Gullikson, C.C. Walton, L. Golub, E. DeLuca. EUV Multilayers for solar physics proc[J]. SPIE, Publication in Preparation, 2003,5166:.

. S. Chakrabarti, R. Kimble, S. Bowyer. Spectroscopy of the (350-1400 A)[J]. J. Geophysical Res,1984, 89:5660-5665.

. D.L. Windt. IMD-software for modeling the optical properties of multilayer films[J]. Computers in Physics,1998,12:360-370.

. B.L. Henke, E.M. Gullikson, J.C. Davis. X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-30 000 eV, Z=1~92[J]. Atomic Data and Nuclear Data Tables,1993,54(12):181-342.

浏览量

428

下载量

CSCD

文章被引用时，请邮件提醒。

提交

工具集

关联资源

Experimental investigation of laser-produced-plasma EUV source based on liquid target