Optical broadband monitoring of thin film growth

H. Ehlers; T. Groβ; M. Lappschies; D. Ristau

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Optical broadband monitoring of thin film growth

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- Optical broadband monitoring of thin film growth
- Optical broadband monitoring of thin film growth
- 光学精密工程 2005年13卷第4期页码：403-412
- 作者机构：
  
  Laser Zentrum Hannover, Hollerithallee 8, 30419 Hannover, Germany
- 作者简介：
- 基金信息：
- DOI：
  中图分类号：
- 收稿日期：2005-06-06，
  
  修回日期：2005-06-16，
  
  网络出版日期：2005-08-30，
  
  纸质出版日期：2005-08-30
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H. Ehlers, T. Groβ, M. Lappschies, 等. Optical broadband monitoring of thin film growth[J]. 光学精密工程, 2005,13(4):403-412.

H. Ehlers, T. Groβ, M. Lappschies, et al. Optical broadband monitoring of thin film growth[J]. Optics and precision engineering, 2005, 13(4): 403-412.
H. Ehlers, T. Groβ, M. Lappschies, 等. Optical broadband monitoring of thin film growth[J]. 光学精密工程, 2005,13(4):403-412. DOI：

H. Ehlers, T. Groβ, M. Lappschies, et al. Optical broadband monitoring of thin film growth[J]. Optics and precision engineering, 2005, 13(4): 403-412. DOI：

摘要

This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context

the present study gives a review on selected combinations of conventional and ion deposition techniques with different broadband online spectrophotometric systems. Besides two systems operating in the VIS- and NIR-spectral range in combination with ion processes

also a monochromator system developed for conventional deposition processes in the DUV/VUV-spectral range will be discussed. The considerations will be concluded by a comparison of the major advantages of the specific combinations of processes with online monitoring concepts and by a brief outlook concerning future challenges.

Abstract

This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context

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references

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