Research of multilayers in EUV;soft X-ray and X-ray

WANG Zhan-shan; WANG Feng-li; ZHANG Zhong; WANG Hong-chang; WU Wen-juan; ZHANG Shu-min; XU

doi:null

您当前的位置：

首页 >

文章列表页 >

Research of multilayers in EUV;soft X-ray and X-ray

更新时间：2020-08-12

- Research of multilayers in EUV;soft X-ray and X-ray
- Research of multilayers in EUV;soft X-ray and X-ray
- 光学精密工程 2005年13卷第4期页码：512-518
- 作者机构：
  
  Institute of Precision Optical Engineering, Department of Physics, Tongji University Shanghai,China,200092
- 作者简介：
- 基金信息：
- DOI：
  中图分类号：
- 收稿日期：2005-06-06，
  
  修回日期：2005-06-16，
  
  网络出版日期：2005-08-30，
  
  纸质出版日期：2005-08-30
- 稿件说明：
移动端阅览
WANG Zhan-shan, WANG Feng-li, ZHANG Zhong, 等. Research of multilayers in EUV;soft X-ray and X-ray[J]. 光学精密工程, 2005,13(4):512-518.

WANG Zhan-shan, WANG Feng-li, ZHANG Zhong, et al. Research of multilayers in EUV;soft X-ray and X-ray[J]. Optics and precision engineering, 2005, 13(4): 512-518.
WANG Zhan-shan, WANG Feng-li, ZHANG Zhong, 等. Research of multilayers in EUV;soft X-ray and X-ray[J]. 光学精密工程, 2005,13(4):512-518. DOI：

WANG Zhan-shan, WANG Feng-li, ZHANG Zhong, et al. Research of multilayers in EUV;soft X-ray and X-ray[J]. Optics and precision engineering, 2005, 13(4): 512-518. DOI：

摘要

To develop beam splitters for soft X-ray laser Michelson interferometer at 13.9 nm

Mo/Si multilayers of 100 nm thickness deposited on both sides of silicon nitride were fabricated by using DC magnetron sputtering. Initial evaluation of their reflectivity and transmission showed that reflectivity and transmission were above 10% and 25%. The broadband analyzers have been designed

fabricated and characterized for 13~20 nm polarization measurements. The measured results are in good agreement with the design. The supermirrors with different angular intervals at 0.154 nm have been designed

fabricated and characterized.

Abstract

To develop beam splitters for soft X-ray laser Michelson interferometer at 13.9 nm

fabricated and characterized.

关键词

Keywords

references

. D.G.Stearn,R.S.Rosen,S.P.Vernon.Fabrication of high-reflectance Mo-Si multilayer mirrors by planar-magnetron sputtering[J].J. Vac. Sci. Technol.,1991,A9:2662-2669.

. G.Seitz1,S. Schulte,U.Dinger,O.Hocky,B.Fellner,M.Rupp.EUV lithography:a challenge for optical metrology[J].Proc. SPIE,2004,5533:20-26.

. D.L.Windt,S.Donguy,J.Seely,B.Kjornrattanawanich.Experimental comparison of extreme-ultraviolet multilayers for solar physics[J].Appl. Opt., 2004,43:1835-1839.

. J.H.Underwood,A.C.Thompson,J.B.Kortright,K.C.Chapman,D.Luntt.Focusing X-rays to a 1 μm spot using elastically bent, graded multilayer coated mirrors[J]. Rev. Sci. Instrum.,1996,57:3359.

. T.Aota,N.Yamaguchi,M.Yoshikawa,K.Ikeda,T.Ishijima,Y.Okamoto,A.Mase,T.Tamano.Two-dimensional imaging X-ray spectrometer for plasma diagnostics .Fusion Engineering and Design1997,34-35, 189-191.

. L.B.DaSilva,T.W.Barbee,R.Jr, Cauble, et al.Electron density measurements of high density plasma using soft X-ray laser interferometry[J].PhysRevLett.,1995, 74:3991-3994.

. F.Delmotte,M.F.Ravet,F.Bridou,F.Varnière,P.Zeitoun,S.Hubert,L.Vanbostal,G.Soullie.X-ray-ultraviolet beam splitters for the Michelson interferometer[J].Appl. Opt.2002,41:5905-5912.

浏览量

642

下载量

CSCD

文章被引用时，请邮件提醒。

提交

工具集

关联资源

暂无数据