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1. Laboratory of Solid State Microstructure and Department of Materials Science and Engineering, Nanjing University Nanjing,China,210093
2. Institut für Mineralogie, Freie Universit t Berlin Berlin,Germany,14195
收稿日期:2005-06-06,
修回日期:2005-06-16,
网络出版日期:2005-08-30,
纸质出版日期:2005-08-30
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C. Z. Tan. Determination of surface structure and the depth profile of silica glass by infrared spectroscopy[J]. 光学精密工程, 2005,13(4):413-420.
C. Z. Tan. Determination of surface structure and the depth profile of silica glass by infrared spectroscopy[J]. Optics and precision engineering, 2005, 13(4): 413-420.
C. Z. Tan. Determination of surface structure and the depth profile of silica glass by infrared spectroscopy[J]. 光学精密工程, 2005,13(4):413-420. DOI:
C. Z. Tan. Determination of surface structure and the depth profile of silica glass by infrared spectroscopy[J]. Optics and precision engineering, 2005, 13(4): 413-420. DOI:
The surface structure and properties are different from those of the bulk
depending on the substrate materials and deposition condition
and playing an important role in precise optical components. The conventional spectroscopic methods to monitor the surface structure are restricted only in several layers of molecules. It is known that the penetration depth of the incident light increases with its wavelength and decreases with the angle of incidence. Thus infrared spectroscopy provides a powerful means for determination of surface structure and the depth profile up to micrometers. By recording the reflection spectra at different angles of incidence
the surface structure and its depth profile can be monitored successively. Further
the incident field has the subcomponents parallel and perpendicular to the surface
which excite the transverse and longitudinal optic modes
respectively. Change of the polarization direction of the incident light provides a practical function to study anisotropic property of the surface and the interaction between the transverse and longitudinal optic modes. In this work
infrared spectrophotometer was applied to investigate the depth profile in microstructure of silica glass. Combining with the glass fiber system
this technique can be used for in-situ control of the deposition process. In comparing with ellipsometry
this method reveals both structural and constitutional information.
The surface structure and properties are different from those of the bulk
depending on the substrate materials and deposition condition
and playing an important role in precise optical components. The conventional spectroscopic methods to monitor the surface structure are restricted only in several layers of molecules. It is known that the penetration depth of the incident light increases with its wavelength and decreases with the angle of incidence. Thus infrared spectroscopy provides a powerful means for determination of surface structure and the depth profile up to micrometers. By recording the reflection spectra at different angles of incidence
the surface structure and its depth profile can be monitored successively. Further
the incident field has the subcomponents parallel and perpendicular to the surface
which excite the transverse and longitudinal optic modes
respectively. Change of the polarization direction of the incident light provides a practical function to study anisotropic property of the surface and the interaction between the transverse and longitudinal optic modes. In this work
infrared spectrophotometer was applied to investigate the depth profile in microstructure of silica glass. Combining with the glass fiber system
this technique can be used for in-situ control of the deposition process. In comparing with ellipsometry
this method reveals both structural and constitutional information.
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