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Optical Technology and Research Center, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130022, China
收稿日期:2005-06-06,
修回日期:2005-06-16,
网络出版日期:2005-08-30,
纸质出版日期:2005-08-30
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GAO Jin-song, XU Ying, WANG Xiao-yi, 等. ITO thin films prepared by electron beam evaporation with End-Hall ion source assisted without heating to the substrate[J]. 光学精密工程, 2005,13(4):397-402.
GAO Jin-song, XU Ying, WANG Xiao-yi, et al. ITO thin films prepared by electron beam evaporation with End-Hall ion source assisted without heating to the substrate[J]. Optics and precision engineering, 2005, 13(4): 397-402.
GAO Jin-song, XU Ying, WANG Xiao-yi, 等. ITO thin films prepared by electron beam evaporation with End-Hall ion source assisted without heating to the substrate[J]. 光学精密工程, 2005,13(4):397-402. DOI:
GAO Jin-song, XU Ying, WANG Xiao-yi, et al. ITO thin films prepared by electron beam evaporation with End-Hall ion source assisted without heating to the substrate[J]. Optics and precision engineering, 2005, 13(4): 397-402. DOI:
ITO (indium oxide doped with tin) thin films were deposited on glass substrates by using ITO pellet with a composition of
w
(In
2
O
3
)=90% and
w
(SnO
2
)=10% by electron beam evaporated with End-Hall ion source assisted without extra heating. The rate of deposition and flow rate of oxygen were measured and changed to obtain the best properties of ITO thin films. Furthermore
the post annealing process was done in vacuum at different annealing temperatures for 2 h and at 400℃ for different keeping time
respectively. The relation between optical
electrical properties and structure was discussed in detail.
ITO (indium oxide doped with tin) thin films were deposited on glass substrates by using ITO pellet with a composition of
w
(In
2
O
3
)=90% and
w
(SnO
2
)=10% by electron beam evaporated with End-Hall ion source assisted without extra heating. The rate of deposition and flow rate of oxygen were measured and changed to obtain the best properties of ITO thin films. Furthermore
the post annealing process was done in vacuum at different annealing temperatures for 2 h and at 400℃ for different keeping time
respectively. The relation between optical
electrical properties and structure was discussed in detail.
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