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1. Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences Changchun,China,130033
2. Graduate School of the Chinese Academy of Sciences Beijing,China,100039
3. Institute of Atomic and Molecular Physics, Jilin University Changchun,China,130026
收稿日期:2005-06-06,
修回日期:2005-06-27,
网络出版日期:2005-10-30,
纸质出版日期:2005-10-30
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QI Li-hong, NI Qi-liang, CHEN Bo. Experimental investigation of laser-produced-plasma EUV source based on liquid target[J]. 光学精密工程, 2005,13(5):604-607.
QI Li-hong, NI Qi-liang, CHEN Bo. Experimental investigation of laser-produced-plasma EUV source based on liquid target[J]. Optics and precision engineering, 2005, 13(5): 604-607.
QI Li-hong, NI Qi-liang, CHEN Bo. Experimental investigation of laser-produced-plasma EUV source based on liquid target[J]. 光学精密工程, 2005,13(5):604-607. DOI:
QI Li-hong, NI Qi-liang, CHEN Bo. Experimental investigation of laser-produced-plasma EUV source based on liquid target[J]. Optics and precision engineering, 2005, 13(5): 604-607. DOI:
A laser-produced plasma(LPP) source was built using liquid as target and a Nd:YAG laser as the irradiation laser
and the LPP source's radiation with ethanol and acetone target respectively was measured by an AXUV100 silicon photodiode combined with a McPHERSON model 247 grazing incidence monochromator of the resolution Δλ≤0.075 nm and the wavelength scanning interval 0.5 nm. Both ethanol and acetone target LPP source had EUV emission at 11~20 nm wavelength. The comparison between the spectra of the two kinds of target materials shows that all the two kinds of target source's spectra are the result of oxygen ions' transitions under current source's parameters
but the spectrum intensity from different target sources is different. The spectra intensity from the ethanol target is higher than that from the acetone target. In addition
the target liquid is forced into the vacuum chamber by the background pressure supported by the connected external high pressure gas
and the influence of the background pressure on the source's intensity is investigated.
A laser-produced plasma(LPP) source was built using liquid as target and a Nd:YAG laser as the irradiation laser
and the LPP source's radiation with ethanol and acetone target respectively was measured by an AXUV100 silicon photodiode combined with a McPHERSON model 247 grazing incidence monochromator of the resolution Δλ≤0.075 nm and the wavelength scanning interval 0.5 nm. Both ethanol and acetone target LPP source had EUV emission at 11~20 nm wavelength. The comparison between the spectra of the two kinds of target materials shows that all the two kinds of target source's spectra are the result of oxygen ions' transitions under current source's parameters
but the spectrum intensity from different target sources is different. The spectra intensity from the ethanol target is higher than that from the acetone target. In addition
the target liquid is forced into the vacuum chamber by the background pressure supported by the connected external high pressure gas
and the influence of the background pressure on the source's intensity is investigated.
. SILFVAST W T,RICHARDSON M C,BENDER H,et al.Laser-produced plasmas for soft X-ray projection lithography[J].J. Vac. Sci. Technol,1992,B10:3126-3133.
. KAUFFMAN R L,PHILLION D W,SPITZER R C.X-ray production 13 nm from laser-produced plasma for projection X-ray lithography application[J]. Appl. Opt., 1993,32:6897-6900.
. MICHETTE A G.X-ray microscopy[J].Rep. Prog. Phys., 1988, 51:1525-1604.
. FLORA F,MEZI L,BOLLANTI S,BONFIGLI F,LAZZARO P,LETARDI T,ZHENG CH.Krypton as filter ions, debris useless radiation in EUV projection lithography system[J].SPIE, 2001,4504:77-86.
. BARTNIK F H,ZBIGNIEW A P.X-ray generation from Nd laser-irradiated gas puff target[J].SPIE,1993,2015:57-62.
. KUBIAK G D,BERNARDEZ L J,KRENZ K.Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography[J].SPIE, 1999,3676:669-678.
. KUBIAK G D,KRENZ K D,BERGER K W.Cryogenic pellet laser plasma source targets .OSA Proceedings, 1995,21:248-254.
. HANSSON B A M,RYMELL L,BERGLUND M,et al.Liquid-xenon-jet laser-plsma source for EUV lithography[J].SPIE, 2001,4566:1-8.
. LIN J Q,YASHIRO H,AOTA T,et al.EUV generation using water droplet target[J].SPIE, 2004,5374:906-911.
. RICHARDSON M,KODAY C S,TAKENOSHITA K,et al.High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography[J]. J. Vac. Sci. Technol. B, 2004,22(2):785-790.
. JASSON P A C,HASSON B A M,HEMBERG O,et al.Liquid-tin-jet laser-plasma extreme ultraviolet generation[J]. Applied Physics Letters, 2004,84(13):2256-2258.
. NI Q L. Study on laser-produced plasma soft X-ray source with liquid aerosol spray target . Ph. D. Thesis, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2003. (in Chinese)
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