The HfO

2

and SiO

2

films were coated using ion beam assisted deposition and e-beam deposition

and the antireflective films were coated by periodic ion beam assisted deposition and e-beam deposition also. The weak absorption

residual stress and Laser-Induced Damage Thresholds(LIDT) were measured. Comparing with e-beam deposition

the measured results show that the films coated by ion beam assisted deposition have a higher weak absorption

lower tensile stress and lower LIDT

and the antireflective films prepared by periodic ion beam assisted deposition have a lower residual stress also

but the weak absorption of the films increases a little

and LIDT increases from 10.91 J/cm

2

to 18 J/cm

2

. The results indicate the periodic ion beam assisted deposition can improve the LIDT effectively

which provides a new way for application of ion beam assisted deposistion to preparation of high threshold laser films.