Some key technologies on soft X-ray and Extreme Ultraviolet (EUV) optics developed at CIOMP are reviewed in this paper. The technology for laser-produced plasma sources is described and a laser-produced plasma source with a liquid target worked at wavelength range of 6~22 nm has been developed. Soft X-ray and EUV photon-counting imaging is introduced and a two-dimensional photon-counting detector with position sensitive anode is fabricated. The active area of the detector is 25 mm in diameter and the resolution is 0.3 mm. The technology of super-smooth mirror fabrication is studied and a polishing machine has been developed to fabricate the super-smooth surface mirrors with the roughness and the figure of 0.6 nm (RMS) and 6 nm (RMS)

respectively. Soft X-ray and EUV multilayer film technologies are coverd also in the paper and a number of mutilayer coating mirrors have been deposited for some space science projects. These multilayer mirrors show their reflectivity of 60% at 13 nm and the uniformity better than ±2.5% across a 150 mm diameter. The soft X-ray and EUV radiometric technologies are studied and a reflectometer

with operational wavelength range of 5~50 nm

spectrum resolution of 0.2 nm and repeatability better than 1% has been set up. Based on a cutting-edge technology

an EUV imager and a space EUV solar telescope are developed

these imaging instruments have played an important role in a number of scientific projects.