The Reflectivity Measurement of normal- incidence Mo/Si Multilayer mirrors in 13.9nm and 19.6nm[J]. Optics and precision engineering, 2008, 16(9): 1666-1672.
The Reflectivity Measurement of normal- incidence Mo/Si Multilayer mirrors in 13.9nm and 19.6nm[J]. Optics and precision engineering, 2008, 16(9): 1666-1672.DOI:
Mo/Si multilayer mirrors were designed after theoretical simulation
whose central wavelength were 13.9nm Ni-like Ag and 19.6nm Ne-like Ge x-ray laser respectively. The reflectivity measuring set-up was composed of Mcpherson 247 monochromator and a small reflectometer. The Extreme Ultraviolet(EUV)source was copper-target Laser Produced Plasmas(LPP) source. The result showed that the central wavelength of Mo/Si multilayer mirrors were 13.91nm and 19.60nm respectively
the corresponding reflectivity were around 41.9% and 22.6%
and the related FWHM were 0.56nm and 1.70nm
the central wavelength and FWHM agreed with theoretical value basically. In order to study the Mo/Si multilayer performance
the measurement of surface roughness was carried out using WYKO
the surface roughness were 0.52nm for 13.9nm and 0.55nm for 19.6nm.