大高宽比、高线密度X射线透射光栅的制作

柳龙华; 刘刚; 熊瑛; 黄新龙; 陈洁; 李文杰; 田金萍; 田扬超

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大高宽比、高线密度X射线透射光栅的制作

现代应用光学 | 更新时间：2020-08-12

- 大高宽比、高线密度X射线透射光栅的制作
- Fabrication of high-aspect-ratio and high-density X-ray transmission grating
- 光学精密工程 2009年17卷第1期页码：72-77
- 作者机构：
  
  中国科学技术大学国家同步辐射实验室, 安徽合肥 230029
- 作者简介：
- 基金信息：
  
  国家自然科学基金资助项目(No. 10675113();No. 10734070)()
- DOI：
  中图分类号： O436.1;TN305.7
- 收稿日期：2008-09-01，
  
  修回日期：2008-12-16，
  
  网络出版日期：2009-01-25，
  
  纸质出版日期：2009-01-25
- 稿件说明：
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柳龙华, 刘刚, 熊瑛, 黄新龙, 陈洁, 李文杰, 田金萍, 田扬超. 大高宽比、高线密度X射线透射光栅的制作[J]. 光学精密工程, 2009,17(1): 72-77

LIU Long-hua, LIU Gang, XIONG Ying, HUANG Xin-long, CHEN Jie, LI Wen-jie, TIAN Jin-ping, TIAN Yang-chao. Fabrication of high-aspect-ratio and high-density X-ray transmission grating[J]. Editorial Office of Optics and Precision Engineering, 2009,17(1): 72-77
柳龙华, 刘刚, 熊瑛, 黄新龙, 陈洁, 李文杰, 田金萍, 田扬超. 大高宽比、高线密度X射线透射光栅的制作[J]. 光学精密工程, 2009,17(1): 72-77 DOI：

LIU Long-hua, LIU Gang, XIONG Ying, HUANG Xin-long, CHEN Jie, LI Wen-jie, TIAN Jin-ping, TIAN Yang-chao. Fabrication of high-aspect-ratio and high-density X-ray transmission grating[J]. Editorial Office of Optics and Precision Engineering, 2009,17(1): 72-77 DOI：

摘要

利用电子束光刻、X射线光刻和微电镀技术

成功制作了面积为1 mm1 mm

周期为300 nm

金吸收体厚度为1 m的用于X射线显微成像的透射光栅。首先

利用电子束光刻和微电镀技术在Si

薄膜上制作周期为300 nm

厚度为250 nm的高线密度光栅掩模;然后

利用X射线光刻和微电镀技术复制厚度为1 m

占空比接近1∶1

高宽比为7的X射线透射光栅。整个工艺流程充分利用了电子束光刻技术制作高分辨率图形和X射线光刻技术制作大高宽比结构的优点

实现了大高宽比、纳米尺度、侧壁陡直的X射线透射光栅的制作。

Abstract

A transmission grating with an area of 1 mm 1 mm

a pitch of 300 nm

and a gold thickness of 1 m for X-ray imaging and microscopy is successfully fabricated by combining electron beam lithography

X-ray lithography

and electroplating. Firstly

a high-density mask in pitch of 300 nm and gold thicknes of 250 nm for transmission grating is originally patterned on the Si

membranes by electron beam lithography and electroplating. Then

the X-ray lithography and electroplating are used to replicate the transmission grating with the profile thickness of 1 m

aspect ratio of 7

and the duty cycle about 1∶1.Experimental results show that the fabrication method combining electron beam lithography

X-ray lithography and electroplating has advantages over other fabrication methods in big pitch

nanometer scale and straight side well for transmission grating.

关键词

Keywords

references

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