In order to achieve high efficiency and low damaged layer during sapphire crystal lapping process

experimental research on rougness

lapping uniformity and sub-surface damaged layer were studied in this paper. Sapphire with (0001) orientation was lapped by 280 mesh boron carbide abrasive grits

firstly

effects of lapping times on the material remove rate and surface roughness were investigated

then micro-surface uniformity was also presented by using WYKO equipment. Finally

Nano-indentation test was applied to measure the depth of damaged layer according to the hardness or modulus variance. Experimental results show that sapphire crystal with average roughness Ra0.523μm and Rt<6.0μm

depth of sub-surface damaged layer not more than 1μm

could be achieved by dual-lapping abrasive machining with 280 mesh boron carbide grits in 120 minutes.