Abstract: We presented the motion model formulas of the ion source subsystem when the ion bean figuring (IBF) facility is used to figure aspheric optics

and also other optics. The de-convolved process of dwell time function was transferred to a linear matrix equation

which could be easy to optimize to get the optimized dwell time resolution. By the analysis of the located errors

we proposed that the final figure errors caused by the located errors of the ion source five-axis motion subsystem could be attributed to a coefficient factor

The best way to assure the IBF process stable and the spared cost is that we should take both the ion beam material removal function and the located errors into account to design the five-axis system accuracy

Only emphasis on the located errors is not economical method.