A novel miro-area micro/nanoimprinting lithography technology is introduced. Compared with conventional nanoimprinting lithography approach

the proposed method is characterized as by combining of distributed imprinting units

large-format micro-structure is fabricated. Another advantage of the approach lies in the fact that the imprinting mould can rotate in the working plane and each imprint unit can have pre-determined structure orientation and embossing pressure can by control program. The mentioned nanoimprinting lithography method is suitable for fabrication of optical variable diffraction image and devices used in flat-panel displays.