Abstract: Combined with the technigue of holographic interference and the ashing of photoresist

a straight and clean mask of phtoresist with small line-to-period can be fabricated on off-cut silicon (111) wafers. We present a simple and convenient method of controlling the profile of a blazed grating that consists of using patterned native oxide layer as the mask of anisotropic etching to obtain near-ideal grooves of sawtooth. With the blazed grating profile well controlled by this technique

a 1200 g/mm blazed grating was fabricated

which had a blaze angle of 5.0° and smooth blaze facets of about 0.2 nm rms. The grating was measured to blaze at the wavelength of 135 nm. It is believed that high-groove-efficiency blazed gratings used in the wavelengths of extreme ultraviolet and soft x-ray can be easily fabricated by this method at normal or near normal incidence.