Design and tolerance analysis of Offner compensator for high order aspheric surface null testing[J]. Optics and precision engineering, 2010, 18(1): 88-93.
Design and tolerance analysis of Offner compensator for high order aspheric surface null testing[J]. Optics and precision engineering, 2010, 18(1): 88-93.DOI:
90nm nodal point lithography projecting lens requires high surface accuracy. This literature presents a kind of the Offner compensator using three pieces of the lenses. Equal quantity of the spherical error was introduced to compensate all orders of aspheric coefficient. Certain quantity axial spherical aberration was introduced to compensate the normal direction deviation of aspheric surface. The results indicate that: primary and high order aberrations were balanced well enough. The design wavelength is 632.8nm. MTF exceeds diffraction limit
mean square wave front error <λ/1250
The F-number can achieve F/1.64. At last
a loosen distribution of the tolerance was presented based on the accuracy of measuring apparatus.