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光学技术中心2.
收稿日期:2010-12-02,
修回日期:2011-01-10,
网络出版日期:2011-10-21,
纸质出版日期:2011-08-25
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刘小涵,冯晓国. 球面旋涂光刻胶的工艺理论[J]. 光学精密工程, 2011, 19(8): 0-0.
LIU Xiao-Han,FENG Xiao-Guo. Process theory of spherical photoresist spin coating[J]. Editorial Office of Optics and Precision Engineering, 2011, 19(8): 0-0.
为了在凹球面内表面涂布厚度均匀的光刻胶,进行了离心式涂胶工艺理论研究。首先讨论了影响膜厚均匀性的主要因素,接着用流体力学理论分析了离心式开口向下球面涂胶过程中胶液的受力流动状态,推导出胶膜厚度与离心机转速、胶液粘度、旋涂时间等参数变化规律的数学模型,最后为了验证理论的正确性,在口径φ120mm,凹球面半径300mm,矢高12.5mm的K9玻璃试验件内表面开展涂胶工艺实验。经试验测试结果分析:该理论分析模型与实际情况是相符的,根据理论分析采用主轴与工件旋转轴偏心的装夹方法,在整个球面内表面可以得到厚度均匀的胶膜。当光刻胶粘度为110厘泊~190厘泊,主轴转速为3000~6000转/分,在凹球面上可以涂布厚度为0.5μm~1μm的均匀胶膜。
In order to uniform thickness photoresist coating on the concave spherical surface
the coating technology of centrifugal is researched. First
the critical factors that affect the evenness of photosensitive resist and the film forming force are investigated. Then
the centrifugal glue adhesive force during the flow state is analysed with the hydrodynamic theory of the spherical photoresist spin coating down opening. A mathematical model which describes the relationship among the film thickness and centrifuge speed and viscosity of photoresist and time of spin coating is derived. Finally
in order to verify the correctness of the formula
some experiments of photoresist spin coating on the concave sphere of diameter φ120mm
radius 300mm
vector height 12.5mm of K9 glass dome are carried out. The result which has been tested is certificated that the theory is consistent with the actual situation
The paper analyzed the fomula and concluded: when the axis of photoresist pin coating should be disalignment with the main axis of electric engine
uniform film thickness on the inner surface of the entire sphere can be obtained. When the viscosity of 110~190centipoise
the speed of 3000~6000/r.min-1
the uniform film thickness of 0.5μm ~1μm can be get on concave sphere.
付永启,赵晶丽,离心式胶膜均匀性的影响因素分析,光学精密工程,1996.Fu yongqi ,Zhao jingli ,Centrifugal film uniformity of the factor analysis, Optics and Precision Engineering,1996. [2] 付永启,李凤友,离心涂胶过程的参数变化分析与模拟,光学精密工程,1998Fu yongqi,Li fengyou, Centrifugal coating process analysis and simulation parameters, Optics and Precision Engineering,1998.[3] 赵晶丽,王惠卿,冯晓国,梁凤超,凹球面涂布光刻胶均匀性研究[J].应用光学,2009Zhao jingli, Wang huiqing, Concave spherical surface uniformity of photoresist coating [J]. Applied Optics,2009. [4] 付永启,赵兴国,赵晶丽,柱面图形光学刻划的研究[J].仪器仪表学报,1999.Fu yongqi,Zhao xingguo,Zhao jingli,Graphic characterization of the optical cylinder [J]. INSTRUMENT .[5] FENG Xiao-guo, SUN Lian-chun ,Mathematical model of spin-coated photoresist on a spherical substrate [J],Optics Express ,2005,18(13):7070-7075.[6] 谢永军.曲面激光直写技术.中国科学院研究生院博士学位论文.2004. Xie yongjun, Surface laser direct writing technology. PhD thesis, Graduate School of Chinese Academy of Sciences .[7] 岳宏达.光盘染料旋涂的流动机制与工艺理论研究.清华大学博士学位论文.2003 YUE Hongda. Mechanics analysis in CD-R dye coating process, PhD thesis, Graduate School of QINGHUA,2003. [8]Acrivos A,ShahM J,and Petersen E E.On the flow of a non-newtonian liquid on a rotating disk.J.Appl.Phys,1960,31(6):963-968.
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