A new nano-process technique beyond conventional optical lithography was introduced. As the main mechanisms

field enhancement effect was discussed. Using Finite Difference Time Domain method(FDTD)

the near-field optical distribution of metallic tips was simulated. Nanofabrication on PMMA surfaces using an Atomic Force Microscope(AFM) tip under femto-second laser irradiation was investigated. Various lines and letters of different widths were processed

then fabricated patterns were tested by the same AFM tip in situ. Without optimization of the laser parameters

100 nm resolution which is better than far field fabrication of our research group (~200 nm) was obtained.