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1.中国科学院 电工研究所,北京 100190
2.中国科学院大学,北京 100049
[ "解孟涛(1996-),男,河南焦作人,硕士研究生,2019年于辽宁大学获得学士学位,主要从事电子束曝光技术的研究。E-mail:jiemt@mail.iee.ac.cn" ]
[ "刘俊标(1974-),男,福建莆田人,研究员,2001年于南京航空航天大学获得博士学位,主要从事电子光学、电子束及应用的研究。E-mail:liujb@mail.iee.ac.cn" ]
收稿日期:2021-07-18,
修回日期:2021-08-09,
纸质出版日期:2022-01-15
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解孟涛,刘俊标,王鹏飞等.离心法曲面涂胶的胶层厚度研究[J].光学精密工程,2022,30(01):71-77.
XIE Mengtao,LIU Junbiao,WANG Pengfei,et al.Research on resist-layer thickness by spin-coating on curved substrate[J].Optics and Precision Engineering,2022,30(01):71-77.
解孟涛,刘俊标,王鹏飞等.离心法曲面涂胶的胶层厚度研究[J].光学精密工程,2022,30(01):71-77. DOI: 10.37188/OPE.2021.0477.
XIE Mengtao,LIU Junbiao,WANG Pengfei,et al.Research on resist-layer thickness by spin-coating on curved substrate[J].Optics and Precision Engineering,2022,30(01):71-77. DOI: 10.37188/OPE.2021.0477.
曝光工艺中经离心涂敷后抗蚀剂胶层的均匀性对曝光线宽有很大的影响。为了得到高速旋转下抗蚀剂胶体在凹面衬底上所形成膜层厚度的均匀性,在凹面衬底上建立了非牛顿流体微元经离心旋转的流体动力学模型。根据对应的边界条件、非牛顿流体的本构方程和连续性方程,推导并得到了流体性质、曲面面形、旋转速度和时间等因素与最终厚度的关系式。使用流变仪对950 K PMMA C 2%抗蚀剂的流体性质进行标定,在凹面衬底上以旋转速度为单一变量进行离心涂胶实验,使用光谱椭圆偏振仪测量离心后随矢量半径变化的胶体厚度,并与理论推导进行对比。实验结果表明:旋转速度在2 000 r/min时,理论厚度为267 nm,实验所测厚度为230 nm,偏差比率为13.86%;旋转速度在3 000 r/min时,理论厚度为178 nm,实验所测厚度为172 nm,偏差比率为3.37%。考虑到涂胶后,前烘工艺会进一步减小胶层厚度,偏差在正常范围内。本文建立的数学模型具有较好的预见性,可以对胶体经旋转离心后的均匀性提供理论指导。
In lithography, the uniformity of resist coating considerably affects the consistency of line width after spin-coating. To obtain homogeneity of the resist-layer thickness on the upper surface of a curved substrate, a hydrodynamic model of a non-Newtonian fluid element is first established on the surface of the curved substrate under spin-coating. According to the corresponding boundary conditions and constitutive equation and continuity equation of the non-Newtonian fluid, the relationship between the nature of the fluid, curvature radius of the surface, horizontal vector radius, rotation speed and time, and the final thickness of the fluid is deduced and obtained. Second, a rheometer is used to calibrate the fluid viscosity of 950 K PMMA C 2% resist. A spin-coating experiment is conducted on a curved substrate using rotational velocity as a single variable. After centrifugation, the thickness was measured by ellipsometry. The relationship between the resist-layer thickness and the change in the vector radius is obtained and demonstrated with theoretical results. Experimental results show that when the spin speed is 2 000 r/min, the theoretical thickness is 267 nm, measured thickness is 230 nm, and deviation ratio is 13.86%. When the spin speed is 3 000 r/min, the theoretical thickness is 178 nm, measured thickness is 172 nm, and deviation ratio is 3.37%. After spin-coating, the soft-bake will further reduce the thickness of the resist-layer,and the deviation is within the normal range. Therefore, the mathematical model can provide a theoretical guidance for homogeneity after spin-coating, and the established model has a good predictability.
WU H , TIAN Y , LUO H B , et al . Fabrication techniques for curved electronics on arbitrary surfaces [J]. Advanced Materials Technologies , 2020 , 5 ( 8 ): 2000093 . doi: 10.1002/admt.202000093 http://dx.doi.org/10.1002/admt.202000093
高晓峰 , 敖辽辉 , 胡蜀娟 , 等 . 曲面曝光技术在异形曲面高精度线条制造工艺中的应用 [J]. 电讯技术 , 2002 , 42 ( 3 ): 57 - 59 . doi: 10.3969/j.issn.1001-893X. http://dx.doi.org/10.3969/j.issn.1001-893X.
GAO X F , AO L H , HU SH J , et al . Application of bent exposure technology in the manufacture technology of high precision line on abnormity bent surface [J]. Telecommunication Engineering , 2002 , 42 ( 3 ): 57 - 59 . (in Chinese) . doi: 10.3969/j.issn.1001-893X. http://dx.doi.org/10.3969/j.issn.1001-893X.
SONG Y M , XIE Y Z , MALYARCHUK V , et al . Digital cameras with designs inspired by the arthropod eye [J]. Nature , 2013 , 497 ( 7447 ): 95 - 99 . doi: 10.1038/nature12083 http://dx.doi.org/10.1038/nature12083
WANG X D , DONG L , ZHANG H L , et al . Recent progress in electronic skin [J]. Advanced Science , 2015 , 2 ( 10 ): 1500169 . doi: 10.1002/advs.201500169 http://dx.doi.org/10.1002/advs.201500169
顾文琪 . 电子束曝光微纳加工技术 [M]. 北京 : 北京工业大学出版社 , 2004 .
GU W Q . Electron Beam Exposure Micro Nano Machining Technology [M]. Beijing : Beijing University of Technology Press , 2004 . (in Chinese)
林盛浩 . 半导体匀胶系统的研究与优化设计 [D]. 成都 : 电子科技大学 , 2010 .
LIN SH H . Research and Optimization Design of Semiconductor Homogenizing System [D]. Chengdu : University of Electronic Science and Technology , 2010 . (in Chinese)
付永启 , 赵晶丽 . 离心式涂胶膜厚均匀性的影响因素分析 [J]. 光学 精密工程 , 1996 , 4 ( 2 ): 94 - 97 . doi: http://ir.ciomp.ac.cn/handle/181722/31520 http://dx.doi.org/http://ir.ciomp.ac.cn/handle/181722/31520
FU Y Q , ZHAO J L . Analysis of effect on uniformity of photoresist layer in spin coating [J]. Opt. Precision Eng. , 1996 , 4 ( 2 ): 94 - 97 . (in Chinese) . doi: http://ir.ciomp.ac.cn/handle/181722/31520 http://dx.doi.org/http://ir.ciomp.ac.cn/handle/181722/31520
KÁRMÁN T V . Über laminare und turbulente Reibung [J]. ZAMM-Journal of Applied Mathematics and Mechanics , 1921 , 1 ( 4 ): 233 - 252 . doi: 10.1002/zamm.19210010401 http://dx.doi.org/10.1002/zamm.19210010401
EMSLIE A G , BONNER F T , PECK L G . Flow of a viscous liquid on a rotating disk [J]. Journal of Applied Physics , 1958 , 29 ( 5 ): 858 - 862 . doi: 10.1063/1.1723300 http://dx.doi.org/10.1063/1.1723300
ACRIVOS A , SHAH M J , PETERSEN E E . On the flow of a non-Newtonian liquid on a rotating disk [J]. Journal of Applied Physics , 1960 , 31 ( 6 ): 963 - 968 . doi: 10.1063/1.1735785 http://dx.doi.org/10.1063/1.1735785
MEYERHOFER D . Characteristics of resist films produced by spinning [J]. Journal of Applied Physics , 1978 , 49 ( 7 ): 3993 - 3997 . doi: 10.1063/1.325357 http://dx.doi.org/10.1063/1.325357
GIVENS F L , DAUGHTON W J . On the uniformity of thin films: a new technique applied to polyimides [J]. Journal of the Electrochemical Society , 1979 , 126 ( 2 ): 269 - 272 . doi: 10.1149/1.2129019 http://dx.doi.org/10.1149/1.2129019
范椿 . 幂律流体在旋转圆盘上的流动 [J]. 力学与实践 , 1986 , 8 ( 4 ): 31 - 33 .
FAN CH . Flow of a power-law liquid on rotating disk [J]. Mechanics and Engineering , 1986 , 8 ( 4 ): 31 - 33 . (in Chinese)
FENG X G , SUN L C . Mathematical model of spin-coated photoresist on a spherical substrate [J]. Optics Express , 2005 , 13 ( 18 ): 7070 . doi: 10.1364/OPEX.13.007070 http://dx.doi.org/10.1364/OPEX.13.007070
巴音贺希格 , 张浩泰 , 李文昊 . 凹球面基底离心式涂胶的数学模型及实验验证 [J]. 光学 精密工程 , 2008 , 16 ( 2 ): 229 - 234 . doi: 10.3321/j.issn:1004-924X.2008.02.009 http://dx.doi.org/10.3321/j.issn:1004-924X.2008.02.009
BAYANHESHIG , ZHANG H T , LI W H . Mathematic model and experiment verification of spin-coating on concave spherical substrate [J]. Opt. Precision Eng. , 2008 , 16 ( 2 ): 229 - 234 . (in Chinese) . doi: 10.3321/j.issn:1004-924X.2008.02.009 http://dx.doi.org/10.3321/j.issn:1004-924X.2008.02.009
陈龙江 , 罗剑波 , 梁宜勇 , 等 . 球面旋涂胶层厚度分布模型及其实验研究 [J]. 光电子·激光 , 2009 , 20 ( 4 ): 470 - 474 . doi: 10.1145/1651587.1651601 http://dx.doi.org/10.1145/1651587.1651601
CHEN L J , LUO J B , LIANG Y Y , et al . The model of spin-coating photoresist-layer thickness on spherical surface and its experimental verification [J]. Journal of Optoelectronics·Laser , 2009 , 20 ( 4 ): 470 - 474 . (in Chinese) . doi: 10.1145/1651587.1651601 http://dx.doi.org/10.1145/1651587.1651601
刘小涵 , 冯晓国 , 赵晶丽 , 等 . 球面旋涂光刻胶工艺 [J]. 光学 精密工程 , 2011 , 19 ( 8 ): 1810 - 1815 . doi: 10.3788/OPE.20111908.1810 http://dx.doi.org/10.3788/OPE.20111908.1810
LIU X H , FENG X G , ZHAO J L , et al . Process of spherical photoresist spin coating [J]. Opt. Precision Eng. , 2011 , 19 ( 8 ): 1810 - 1815 . (in Chinese) . doi: 10.3788/OPE.20111908.1810 http://dx.doi.org/10.3788/OPE.20111908.1810
KAYAKUAM . Pmma Technical Data Sheet [EB/OL].( 2020-07 ).[ 2021-07 ].KAM-PMMA-TDS. 4 . 12 .21. pdf (kayakuam .com).
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