制作平面全息光栅的离轴抛物镜/洛埃镜干涉系统

巴音贺希格; 邵先秀; 崔继承; 李文昊; 齐向东

doi:10.3788/OPE.20111901.0056

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制作平面全息光栅的离轴抛物镜/洛埃镜干涉系统

现代应用光学 | 更新时间：2020-08-12

- 制作平面全息光栅的离轴抛物镜/洛埃镜干涉系统
- Off-axis parabolic/Lloyd mirror interferometric systems for manufacturing plane holographic gratings
- 光学精密工程 2011年19卷第1期页码：56-62
- 作者机构：
  
  1. 中国科学院长春光学精密机械与物理研究所,吉林长春,中国,130033
  2. 中国科学院研究生院北京,100039
- 作者简介：
- 基金信息：
  
  国家自然科学基金资助项目(No.60478043)();十一五"();国家科技支撑计划重大项目(No.2006BAK03A02)();国家创新方法工作专项项目(
- DOI：10.3788/OPE.20111901.0056
  中图分类号： O438.1;TH744.3
- 收稿日期：2009-10-22，
  
  修回日期：2010-01-18，
  
  网络出版日期：2011-01-22，
  
  纸质出版日期：2011-01-22
- 稿件说明：
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巴音贺希格, 邵先秀, 崔继承, 李文昊, 齐向东. 制作平面全息光栅的离轴抛物镜/洛埃镜干涉系统[J]. 光学精密工程, 2010,19(1): 56-62

Bayanheshig, SHAO Xian-xiu, CUI Ji-cheng, LI Wen-hao, QI Xiang-dong. Off-axis parabolic/Lloyd mirror interferometric systems for manufacturing plane holographic gratings[J]. Editorial Office of Optics and Precision Engineering, 2010,19(1): 56-62
巴音贺希格, 邵先秀, 崔继承, 李文昊, 齐向东. 制作平面全息光栅的离轴抛物镜/洛埃镜干涉系统[J]. 光学精密工程, 2010,19(1): 56-62 DOI： 10.3788/OPE.20111901.0056.

Bayanheshig, SHAO Xian-xiu, CUI Ji-cheng, LI Wen-hao, QI Xiang-dong. Off-axis parabolic/Lloyd mirror interferometric systems for manufacturing plane holographic gratings[J]. Editorial Office of Optics and Precision Engineering, 2010,19(1): 56-62 DOI： 10.3788/OPE.20111901.0056.

摘要

设计和制作具有较高波前平面度和结构稳定的干涉曝光系统是研制高质量平面全息光栅的首要条件。对离轴抛物镜/洛埃镜系统、单透镜/洛埃镜系统、球面反射镜/洛埃镜系统和双分离透镜/洛埃镜系统等4种单反射镜干涉曝光系统产生的干涉条纹直线度进行了光线追迹。在干涉场中放置标准光栅

使用于曝光的两束平行光入射到光栅上

从而衍射光相干叠加产生莫尔条纹;并对上述4个系统产生的莫尔条纹做了模拟。利用Zernike多项式对莫尔条纹进行拟合得到干涉曝光系统的波前像差

比较了4个系统的差异。结果表明

采用离轴抛物镜/洛埃镜系统制作中、小口径平面全息光栅是最为合适的。在此基础上

研制了用于制作最大尺寸为110 mm110 mm

刻线密度>1 200 l/mm的平面全息光栅的离轴抛物镜/洛埃镜干涉曝光系统

在洛埃镜和离轴抛物镜面形精度为/8(=632.8 nm)的前提下

平面全息光栅的衍射波前像差为0.239 6(=550 nm)。此系统经过消除外界扰动和精细装调后

可用于制作衍射波前像差达/6~/7(=550 nm)以上的平面全息光栅。

Abstract

The design and manufacturing of interferometric exposure systems with high wave-front flatness and structural stability is a paramount condition for development of high-quality holographic diffraction gratings. A ray-tracing was carried out on straightness of the interference fringes arisen from four kinds of interferometric exposure systems of Single Reflective Mirrors (SLR)

namely

off-axis parabolic/Lloyd mirror system

single lens/Lloyd mirror system

spherical mirror/Lloyd mirror system and the separation of pairs of lens/Lloyd mirror system. A standard grating was placed in the interferometric field to make two parallel light beams for exposure incident on the grating

so that the diffractive light was superpositioned to appear Moire fringes.Then

the Moire fringes metioned above were simulated.The Zernike polynomial was used to fit the Moire fringes to get wavefront aberration of interferometric exposure systems and to compare the differrences among the four systems. The results show that the off-axis parabolic/Lloyd mirror system is the most appropriate in production of small-caliber plane holographic gratings. On that basis

the off-axis parabolic/Lloyd mirror interferometric exposure system was manufactured to fabricate plane holographic gratings with a maximum size of 110 mm110 mm and the engraved linear density greater than 1200 l/mm.The diffraction grating wave-front aberration produced by the plane holographic grating is 0.239 6 ( = 550 nm)

as the mirror face accuracy aberration between off-axis parabolic mirror and Lloyd mirror is / 8 ( = 632.8 nm).This system can be used to produce plane holographic gratings with wave-front aberration in /6-/7(=550 nm)

if the external disturbance is overcome and finely tuned.

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references

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