非球面精密数控研抛中研抛力的控制

史永杰; 郑堤; 王龙山; 胡利永

doi:10.3788/OPE.20111905.1013

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非球面精密数控研抛中研抛力的控制

微纳技术与精密机械 | 更新时间：2020-08-12

- 非球面精密数控研抛中研抛力的控制
- Polishing force control in precise NC polishing of aspheric parts
- 光学精密工程 2011年19卷第5期页码：1013-1021
- 作者机构：
  
  1. 吉林大学机械科学与工程学院,吉林长春,130025
  2. 宁波大学机械工程与力学学院,浙江宁波,315211
- 作者简介：
- 基金信息：
  
  国家自然科学基金资助项目(No.50705044)();宁波市重点实验室开放基金资助项目(No.2007A22005)()
- DOI：10.3788/OPE.20111905.1013
  中图分类号： TQ171.684
- 收稿日期：2010-07-23，
  
  修回日期：2010-09-08，
  
  网络出版日期：2011-05-26，
  
  纸质出版日期：2011-05-26
- 稿件说明：
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史永杰, 郑堤, 王龙山, 胡利永. 非球面精密数控研抛中研抛力的控制[J]. 光学精密工程, 2011,19(5): 1013-1021

SHI Yong-jie, ZHENG Di, WANG Long-shan, HU Li-yong. Polishing force control in precise NC polishing of aspheric parts[J]. Editorial Office of Optics and Precision Engineering, 2011,19(5): 1013-1021
史永杰, 郑堤, 王龙山, 胡利永. 非球面精密数控研抛中研抛力的控制[J]. 光学精密工程, 2011,19(5): 1013-1021 DOI： 10.3788/OPE.20111905.1013.

SHI Yong-jie, ZHENG Di, WANG Long-shan, HU Li-yong. Polishing force control in precise NC polishing of aspheric parts[J]. Editorial Office of Optics and Precision Engineering, 2011,19(5): 1013-1021 DOI： 10.3788/OPE.20111905.1013.

摘要

提出了一种基于磁流变力矩伺服装置(MRT)的研抛力控制方法来控制非球面数控研抛系统中的研抛力以实现恒压力研抛。研究了该方法的原理、模型、影响因素并研发了相应的实验研究系统。阐述了基于磁流变力矩伺服装置的研抛力控制原理;应用Preston方程分析了恒压力控制的重要性并基于Hertz理论建立了研抛压力模型

进而建立了研抛力控制模型

探讨了影响研抛力控制的主要因素;最后

规划了系统的研抛压力并进行了实验研究。实验结果表明:在研抛用时均为90 min的情况下

恒力研抛得到的非球面表面粗糙度为0.067 m

表面粗糙度不均匀度为94.4%

而恒压力研抛得到的表面粗糙度为0.028 m

表面粗糙度不均匀度为11.4%

研抛质量和效率显著提高。该方法能够独立、主动、实时地控制研抛过程中的研抛力和研抛压力

实现非球面超精密、高效、低成本数控研抛。

Abstract

A novel force control method was proposed based on the Magnetorheological torque-servo (MRT) to control the polishing force to maintain a polishing pressure constant in precise NC polishing of aspheric parts. The mechanism

model and affecting factors of the method were investigated

and a corresponding polishing system was developed. Firstly

the mechanism of the polishing force control method based on the MRT was presented. Then

the principle of constant pressure polishing was analyzed by using Preston equation

and the model of polishing pressure was established according to Hertz theory. Finally

the control model of polishing force was deduced to realize the constant pressure polishing

and the affecting factors of model were discussed. Experimental results indicate that the surface roughness of the part improves from initial value 1.6 m to 0.067 m and 0.028 m respectively

and the unevenness of surface roughness is 94.4% and 11.4%

respectively

after polishing with the constant force and constant pressure and the polishing time in 90 min

which means the polishing quality and effciency have been improved greatly. It is concluded that the method can control the polishing force and polishing pressure independently

actively

and in real time and can improve the surface quality of parts remarkably.

关键词

Keywords

references

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