斜入射干涉检测大口径碳化硅平面反射镜

刘兆栋; 陈磊; 韩志刚; 严庆伟; 朱日宏

doi:10.3788/OPE.20111907.1437

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斜入射干涉检测大口径碳化硅平面反射镜

现代应用光学 | 更新时间：2020-08-12

- 斜入射干涉检测大口径碳化硅平面反射镜
- Measurement of large aperture SiC flat mirrors by oblique incidence interferometry
- 光学精密工程 2011年19卷第7期页码：1437-1443
- 作者机构：
  
  1. 南京理工大学电子工程与光电技术学院, 江苏南京 210094
  2. 南京中科天文仪器有限公司,江苏南京,210042
- 作者简介：
- 基金信息：
  
  江苏省"();六大人才高峰"();基金资助项目(No.06E030)()
- DOI：10.3788/OPE.20111907.1437
  中图分类号： TB92;TH744.3
- 收稿日期：2010-09-13，
  
  修回日期：2010-11-18，
  
  网络出版日期：2011-07-25，
  
  纸质出版日期：2011-07-25
- 稿件说明：
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刘兆栋, 陈磊, 韩志刚, 严庆伟, 朱日宏. 斜入射干涉检测大口径碳化硅平面反射镜[J]. 光学精密工程, 2011,19(7): 1437-1443

LIU Zhao-dong, CHEN Lei, HAN Zhi-gang, YAN Qing-wei, ZHU Ri-hong. Measurement of large aperture SiC flat mirrors by oblique incidence interferometry[J]. Editorial Office of Optics and Precision Engineering, 2011,19(7): 1437-1443
刘兆栋, 陈磊, 韩志刚, 严庆伟, 朱日宏. 斜入射干涉检测大口径碳化硅平面反射镜[J]. 光学精密工程, 2011,19(7): 1437-1443 DOI： 10.3788/OPE.20111907.1437.

LIU Zhao-dong, CHEN Lei, HAN Zhi-gang, YAN Qing-wei, ZHU Ri-hong. Measurement of large aperture SiC flat mirrors by oblique incidence interferometry[J]. Editorial Office of Optics and Precision Engineering, 2011,19(7): 1437-1443 DOI： 10.3788/OPE.20111907.1437.

摘要

采用自行研制的口径为600 mm的近红外相移平面干涉仪在斜入射条件下对大口径碳化硅(SiC)平面反射镜进行了绝对测量。首先

在一个标准的斐索干涉测试结构中测出空腔波面数据;然后

将被测平面置于干涉光路中

使被测件光轴与干涉仪光轴成角

测得第二组波面数据。对两组波面数据处理后得到SiC平面反射镜中心垂线方向的绝对面形分布。最后

测量了630 mm口径SiC反射镜多条垂线方向的绝对面形。结果显示

中心垂线处的绝对检验PV值为0.061

RMS为0.014。实验结果表明

该测量装置可以实现比干涉仪有效口径大的光学平面垂线方向的绝对面形检测

尤其适用于镀有高反膜的光学表面或者金属表面等面形的绝对测量。

Abstract

A self-developed large aperture near-infrared phase-shifting flat interferometer was used to perform an absolute test for a large aperture SiC flat mirror in an oblique incidence condition. Firstly

the cavity wavefront data were obtained in a standard Fizeau configuration

and then the test flat was put into the cavity in its normal axis with an angle to the optical axis of the interferometer to obtain the second wavefront data set. After processing the two data sets

the absolute vertical profile across the center of SiC mirror was also obtained.Finally

several absolute vertical profiles of the

630 mm SiC mirror were measured and the results indicate that PV and RMS of the center absolute vertical profiles are 0.061 and 0.014

respectively. The experimental results show that this measurement device can achieve the absolute tests of vertical direction of flat mirrors with the effective apertures larger than that of the interferometer

and it is especially applicable for the absolute tests of optical sur- faces coated with high-reflection films or metal surfaces.

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references

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