13.5 nm Schwarzschild显微镜系统及成像实验

王新; 穆宝忠; 黄怡; 朱京涛; 王占山; 贺鹏飞

doi:10.3788/OPE.20111908.1709

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13.5 nm Schwarzschild显微镜系统及成像实验

现代应用光学 | 更新时间：2020-08-12

- 13.5 nm Schwarzschild显微镜系统及成像实验
- 13.5 nm Schwarzschild microscope and imaging experiment
- 光学精密工程 2011年19卷第8期页码：1709-1715
- 作者机构：
  
  1. 同济大学精密光学工程技术研究所物理系,上海 200092
  2. 同济大学上海市特殊人工微结构材料与技术重点实验室上海,200092
  3. 同济大学航空航天与力学学院上海,200092
- 作者简介：
- 基金信息：
  
  国家自然科学基金资助项目(No.10825521)();上海市科学技术委员会科研计划资助项目(No.0952nm06900)();国家科技合作项目(No.2008DFA
- DOI：10.3788/OPE.20111908.1709
  中图分类号： TH742.6
- 收稿日期：2010-03-01，
  
  修回日期：2011-04-01，
  
  网络出版日期：2011-08-25，
  
  纸质出版日期：2011-08-25
- 稿件说明：
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王新, 穆宝忠, 黄怡, 朱京涛, 王占山, 贺鹏飞. 13.5 nm Schwarzschild显微镜系统及成像实验[J]. 光学精密工程, 2011,19(8): 1709-1715

WANG Xin, MU Bao-zhong, HUANG Yi, ZHU Jing-tao, WANG Zhan-shan, He Peng-fei. 13.5 nm Schwarzschild microscope and imaging experiment[J]. Editorial Office of Optics and Precision Engineering, 2011,19(8): 1709-1715
王新, 穆宝忠, 黄怡, 朱京涛, 王占山, 贺鹏飞. 13.5 nm Schwarzschild显微镜系统及成像实验[J]. 光学精密工程, 2011,19(8): 1709-1715 DOI： 10.3788/OPE.20111908.1709.

WANG Xin, MU Bao-zhong, HUANG Yi, ZHU Jing-tao, WANG Zhan-shan, He Peng-fei. 13.5 nm Schwarzschild microscope and imaging experiment[J]. Editorial Office of Optics and Precision Engineering, 2011,19(8): 1709-1715 DOI： 10.3788/OPE.20111908.1709.

摘要

研制了工作波长为13.5 nm的Schwarzschild成像显微镜。从共轴两镜系统的基本理论出发

通过消除三级球差、彗差和像散设计了Schwarzschild物镜的光学初始结构

计算了物镜的光学传递函数。结果表明

物镜在0.3 mm视场内像方空间分辨率可达550 lp/mm。根据工作波长和镜面的入射角度设计了Mo/Si周期多层膜反射镜

制作了Schwarzschild显微镜光学元件

多层膜元件对13.5 nm波长的反射率为61%。为了消除可见光和紫外光对系统成像的影响

设计并制备了材料为Zr

Si和Si

的滤波片

该滤波片在13.5 nm处的透过率为21.1%。利用激光等离子体光源对60 lp/mm网格进行了成像实验

结果表明

系统在0.5 mm视场内的分辨率优于3 m

结论认为CCD探测器分辨率极限是影响成像实验分辨率的主要因素。

Abstract

A Schwarzschild microscope working at 13.5 nm was developed. According to the theory of a coaxial two-mirror system

the optical structure of Schwarzschild objective was designed by eliminating third-order spherical aberrations

coma and astigmatism. Experiments show that the spatial resolution of the designed objective achieves 550 lp/mm within the field of 0.3 mm with respect to the calculation of modulation transfer function. Based on the working wavelength and incidence angle of lights

the Mo/Si multilayer optics with the reflectivity of 61% at 13.5 nm was designed and fabricated. In order to remove visible and ultraviolet lights

a filter with materials of Zr

Si and Si

was designed and fabricated

and the transmittance of 21.1% was obtained at 13.5 nm. With the purpose of demonstrating the resolution of microscope

the 60 lp/mm grid backlit by laser produced plasma was imaged via the Schwarzschild microscope on a Charge Coupled Device (CCD)

and the results show that the imaging system can offer the resolution of 3 m in the 0.5 mm field.It concludes that the resolution of imaging experiment is limited by the resolution of CCD camera.

关键词

Keywords

references

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