球面旋涂光刻胶工艺

刘小涵; 冯晓国; 赵晶丽; 高劲松; 张红胜; 程志峰

doi:10.3788/OPE.20111908.1810

您当前的位置：

首页 >

文章列表页 >

球面旋涂光刻胶工艺

微纳技术与精密机械 | 更新时间：2020-08-12

- 球面旋涂光刻胶工艺
- Process of spherical photoresist spin coating
- 光学精密工程 2011年19卷第8期页码：1810-1815
- 作者机构：
  
  1. 中国科学院研究生院,北京 100039
  2. 中国科学院长春光学精密机械与物理研究所中国科学院光学系统先进制造技术重点实验室, 吉林长春 130033
- 作者简介：
- 基金信息：
  
  国防科技预研基金资助项目(No.10.4.2.ZK1001)()
- DOI：10.3788/OPE.20111908.1810
  中图分类号： TN305.7
- 收稿日期：2010-12-02，
  
  修回日期：2010-12-17，
  
  网络出版日期：2011-08-25，
  
  纸质出版日期：2011-08-25
- 稿件说明：
移动端阅览
刘小涵, 冯晓国, 赵晶丽, 高劲松, 张红胜, 程志峰. 球面旋涂光刻胶工艺[J]. 光学精密工程, 2011,19(8): 1810-1815

LIU Xiao-han, FENG Xiao-guo, ZHAO Jing-li, GAO Jin-song, ZHANG Hong-sheng, CHENG Zhi-feng. Process of spherical photoresist spin coating[J]. Editorial Office of Optics and Precision Engineering, 2011,19(8): 1810-1815
刘小涵, 冯晓国, 赵晶丽, 高劲松, 张红胜, 程志峰. 球面旋涂光刻胶工艺[J]. 光学精密工程, 2011,19(8): 1810-1815 DOI： 10.3788/OPE.20111908.1810.

LIU Xiao-han, FENG Xiao-guo, ZHAO Jing-li, GAO Jin-song, ZHANG Hong-sheng, CHENG Zhi-feng. Process of spherical photoresist spin coating[J]. Editorial Office of Optics and Precision Engineering, 2011,19(8): 1810-1815 DOI： 10.3788/OPE.20111908.1810.

摘要

研究了离心式涂胶工艺理论以实现在凹球面内表面涂布厚度均匀的光刻胶。首先

讨论了影响膜厚均匀性的主要因素;接着

用流体力学理论分析了离心式开口向下球面涂胶过程中胶液的受力流动状态

建立了出胶膜厚度与离心机转速、胶液粘度、旋涂时间等参数关系的数学模型;最后

为了验证理论的正确性

在口径120 mm

凹球面半径300 mm

矢高12.5 mm的K9玻璃试验件内表面开展涂胶工艺实验。测试分析结果表明

该理论分析模型与实际情况相符

根据理论分析采用主轴与工件旋转轴偏心的装夹方法

在整个球面内表面可以得到厚度均匀的胶膜。当光刻胶黏度为1.1~1.9 Pa

主轴转速为3 000~6 000 r/min时

可在凹球面上涂布厚度为0.5~1 m的均匀胶膜。

Abstract

A centrifugal coating technology was researched to coating the uniform thickness photoresist on a concave spherical surface. Firstly

the critical factors affecting the uniform of photosensitive resist and the film forming force were investigated. Then

the centrifugal glue adhesive force during the flow state was analysed in the spherical photoresist spin coating down opening based on the hydrodynamic theory. A mathematical model to describe the relationship among the film thickness and centrifuge speed

viscosity of photoresist and the spin coating time was derived. Finally

in order to verify the correctness of the formula

some experiments of photoresist spin coating on the K9 glass concave sphere with a diameter of 120 mm

radius of 300 mm

vector height of 12.5 mm were performed. The experimental results certify that the proposed theory is consistent with the actual situation well.On the theoretical analysis

the uniform film thickness on the inner surface of an entire sphere can be obtained with the disalignment of photoresis pin coating axis and the main axis of electric engine. When the viscosity of photoresist is 1.1~1.9 Pa and the speed of main axis is 3 000-6 000/rmin

-1

the uniform film thickness is 0.5~1 m on a concave sphere.

关键词

Keywords

references

谢永军.曲面激光直写技术 . 北京:中国科学院,2003. Xie Y J. Surface laser direct writing technology .Beijing: Graduate university of the Chinese Academy of Science, 2003. (in Chinese)[2] 付永启,李凤友. 离心涂胶过程的参数变化分析与模拟[J]. 光学精密工程,1998,6(4):75-80. FU Y Q, Li F Y. Centrifugal coating process analysis and simulation parameters[J]. Opt. Precision Eng.,1998, 6(4):75-80.(in Chinese)[3] 赵晶丽,王惠卿,等. 凹球面涂布光刻胶均匀性研究[J]. 应用光学,2009,30(1):101-104. ZH J L, W H Q, et al.. Concave spherical surface uniformity of photoresist coating [J]. Applied Optics,2009,30(1):101-104. (in Chinese)[4] EMSLIE A G. Flow of a viscous liquid on a rotating disk[J].Appl.Phys,1958,29(5):858-862.[5] MEYERHOFER D. Characteristics of resist film produced by spinning[J].Appl.Phys,1978,49(7):3993-3997.[6] DAUGHTON W J,GIVENS F L. An investigation of the thickness variation of spun on thin film commonly associated with the semiconductor industry[J].Electrochem.Soc,1982,129(1):173-179.[7] 巴音贺希格,张浩泰,等. 凹球面基底离心式涂胶的数学模型及实验验证[J]. 光学精密工程,2008,16(2):229-234. BAYAN H X G, ZHANG H T, et al.. Mathematic model and experiment verification of spin-coating on concave spherical substrate[J]. Opt. Precision Eng., 2008,16(2):229-234. (in Chinese)[8] FENG X G, SUN L C. Mathematical model of spin-coated photoresist on a spherical substrate[J]. Optics Express,2005,18(13):7070-7075.[9] 付永启,赵晶丽. 离心式胶膜厚均匀性的影响因素分析[J]. 光学精密工程,1996,4(2):94-97. FU Y Q, ZH J L. Centrifugal film uniformity of the factor analysis[J]. Opt. Precision Eng.,1996.4(2):94-97. (in Chinese)[10] 冯晓国,方梁,等. 金属网栅结构参数设计与制作[J]. 光学精密工程,2005,13(1):59-64. FENG X G, FANG L, et al.. Characteristic dimension design and fabrication of metallic mesh [J]. Opt. Precision Eng., 2005,13(1):59-64. (in Chinese)[11] YUE H D,PAN L F,BIN Y J, et al.. Mechanics analysis in CD-R dye coating process[J].SPIE,2002,4930:253-257.[12] ACRIVOS A, SHAH M J,PETERSEN E E. On the flow of a non-newtonian liquid on a rotating disk[J].Appl.Phys,1960,31(6):963-968.

浏览量

817

下载量

CSCD

文章被引用时，请邮件提醒。

提交

工具集

关联资源

飞秒激光双光子聚合方法加工图案化微透镜及其成像测试

聚酰亚胺薄膜的反应离子刻蚀抛光方法

聚酰亚胺薄膜的反应离子刻蚀抛光

全息光栅制作中光栅掩模槽形形状随光刻胶特性曲线的演化规律

球面旋涂光刻胶的工艺理论