大面积软X射线自支撑金透射光栅的研制

邱克强; 刘正坤; 陈火耀; 徐向东; 刘颖; 洪义麟; 付绍军

doi:10.3788/OPE.20111911.2589

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大面积软X射线自支撑金透射光栅的研制

现代应用光学 | 更新时间：2020-08-12

- 大面积软X射线自支撑金透射光栅的研制
- Fabrication of large area self-supported gold transmission grating for soft X-ray
- 光学精密工程 2011年19卷第11期页码：2589-2595
- 作者机构：
  
  中国科学技术大学国家同步辐射实验室,安徽合肥,230026
- 作者简介：
- 基金信息：
  
  国家自然科学基金委员会-中国工程物理研究院联合基金资助项目(No.10776030)()
- DOI：10.3788/OPE.20111911.2589
  中图分类号： O436.1
- 收稿日期：2011-03-28，
  
  修回日期：2011-05-05，
  
  网络出版日期：2011-11-25，
  
  纸质出版日期：2011-11-25
- 稿件说明：
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邱克强, 刘正坤, 陈火耀, 徐向东, 刘颖, 洪义麟, 付绍军. 大面积软X射线自支撑金透射光栅的研制[J]. 光学精密工程, 2011,19(11): 2589-2595

QIU Ke-qiang, LIU Zheng-kun, CHEN Huo-yao, XU Xiang-dong, LIU Ying, HONG Yi-lin, FU Shao-jun. Fabrication of large area self-supported gold transmission grating for soft X-ray[J]. Editorial Office of Optics and Precision Engineering, 2011,19(11): 2589-2595
邱克强, 刘正坤, 陈火耀, 徐向东, 刘颖, 洪义麟, 付绍军. 大面积软X射线自支撑金透射光栅的研制[J]. 光学精密工程, 2011,19(11): 2589-2595 DOI： 10.3788/OPE.20111911.2589.

QIU Ke-qiang, LIU Zheng-kun, CHEN Huo-yao, XU Xiang-dong, LIU Ying, HONG Yi-lin, FU Shao-jun. Fabrication of large area self-supported gold transmission grating for soft X-ray[J]. Editorial Office of Optics and Precision Engineering, 2011,19(11): 2589-2595 DOI： 10.3788/OPE.20111911.2589.

摘要

针对等离子体诊断及空间环境探测等领域对软X射线透射光栅的需要

采用全息光刻和微电镀技术制作了自支撑软X射线金透射光栅。在基底与光刻胶之间增加减反膜层以降低高反射基底引起的驻波效应对掩模槽形的影响

使用全息光刻技术获得了侧壁陡直的光栅掩模。然后

在掩模顶部镀保护层并使用反应离子刻蚀获得电镀掩模

通过改变保护层厚度来调节电镀掩模的占宽比。最后

利用微电镀技术沉积金

成功制作了线条密度为3 450 gr/mm的自支撑透射光栅

光栅周期约为290 nm

占宽比为0.55

金吸收体为500 nm

光栅尺寸达到10 mm15 mm。在国家同步辐射装置上

测得在5~12 nm软X射线波段其+1级透射衍射效率约为5%。

Abstract

To meet the need of soft X-ray self-supported transmission gratings for space detecting and plasma diagnostics

self-supported gold transmission gratings were successfully fabricated with the holographic lithography and plating technology. To obtain photo-resist mask patterns with steep sidewalls

a layer of Anti-reflection Coating (ARC) was used to attenuate standing wave resulting from the substrate with high reflectivity. Then

a plating mask was obtained by coating a protective chrome on the mask and using Reactive Ion Etching (RIE). In this process

the plating mask with desired duty cycle could be fabricated via changing the thickness of the protective coating. Finally

a self-supported transmission grating with a line density of 3 450 gr/mm (290 nm period)

a duty cycle of 0.55 and 400 nm thick gold bars was fabricated by plating gold in grooves of plating mask. The grating size is up to 10 mm15 mm

and its +1 order diffraction efficiency is about 5% in the soft X-ray band between 5 and 12 nm in the National Synchrotron Radiation Laboratory (NSRL).

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references

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