用于1 m Seya-Namioka单色仪的 1 200 lp/mm Laminar光栅

徐向东; 刘正坤; 邱克强; 刘颖; 洪义麟; 付绍军

doi:10.3788/OPE.20122001.0001

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用于1 m Seya-Namioka单色仪的 1 200 lp/mm Laminar光栅

现代应用光学 | 更新时间：2020-08-12

- 用于1 m Seya-Namioka单色仪的 1 200 lp/mm Laminar光栅
- Fabrication of 1 200 lp/mm Laminar gratings for 1 m Seya-Namioka monochromator at NSRL
- 光学精密工程 2012年20卷第1期页码：1-8
- 作者机构：
  
  中国科学技术大学国家同步辐射实验室,安徽合肥,230026
- 作者简介：
- 基金信息：
  
  国家自然科学基金资助项目(No.10875128)()
- DOI：10.3788/OPE.20122001.0001
  中图分类号： O436.1;TN305.7
- 收稿日期：2011-05-23，
  
  修回日期：2011-07-06，
  
  网络出版日期：2012-01-25，
  
  纸质出版日期：2012-01-25
- 稿件说明：
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徐向东, 刘正坤, 邱克强, 刘颖, 洪义麟, 付绍军. 用于1 m Seya-Namioka单色仪的 1 200 lp/mm Laminar光栅[J]. 光学精密工程, 2012,20(1): 1-8

XU Xiang-dong, LIU Zheng-kun, QIU Ke-qiang, LIU Ying, HONG Yi-lin, FU Shao-jun. Fabrication of 1 200 lp/mm Laminar gratings for 1 m Seya-Namioka monochromator at NSRL[J]. Editorial Office of Optics and Precision Engineering, 2012,20(1): 1-8
徐向东, 刘正坤, 邱克强, 刘颖, 洪义麟, 付绍军. 用于1 m Seya-Namioka单色仪的 1 200 lp/mm Laminar光栅[J]. 光学精密工程, 2012,20(1): 1-8 DOI： 10.3788/OPE.20122001.0001.

XU Xiang-dong, LIU Zheng-kun, QIU Ke-qiang, LIU Ying, HONG Yi-lin, FU Shao-jun. Fabrication of 1 200 lp/mm Laminar gratings for 1 m Seya-Namioka monochromator at NSRL[J]. Editorial Office of Optics and Precision Engineering, 2012,20(1): 1-8 DOI： 10.3788/OPE.20122001.0001.

摘要

针对国家同步辐射实验室燃烧与火焰实验站中1 m Seya-Namioka 单色仪对光栅的需求

采用全息离子束刻蚀工艺制作了1 200 lp/mm Laminar光栅。首先

通过光刻胶灰化技术调节光刻胶光栅掩模占空比

在理论设计的误差允许范围内

对此光栅掩模进行扫描离子束刻蚀;然后

将光栅图形转移到光栅基底中去除残余光刻胶;最后

采用离子束溅射法镀制厚约40 nm的金反射膜

采用热蒸发法镀制厚约60 nm的铝反射膜。用原子力显微镜分析光栅微结构

结果显示光栅槽深为40 nm

占空比为0.45。同步辐射在线波长扫描测试结果表明

镀铝光栅效率明显高于镀金光栅

获得的实验结果与理论计算结果基本符合。镀金光栅已替代进口光栅在线使用3 年

其寿命大大超过复制光栅

基本满足了燃烧实验站的实验研究需求。

Abstract

To meet the need of 1 m Seya-Namioka monochromator for gratings in the combustion and flame endstation at National Synchrotron Radiation Laboratory( NSRL)

1 200 lp /mm Laminar gratings were succesfully fabricated with holographic lithography and ion beam etching.The duty cycle of a resist grating mask was adjusted by resist-ashing

then the resist grating mask was etched in the range of theory design error and its pattern was transfered on a substrate by the scanning ion beam etching method. A gold film with a thickness of 40 nm was coated by ion beam sputtering and an aluminium film with a thickness of 60 nm by evaporating on gratings

respectively

after the rest resist was removed and cleaned. The microstructures of gratings were characterized by an Atomic Force Microscopy(AFM)

and results show that the groove depth is 40 nm and duty cycle is 0.45 for the gratings. Synchrotron radiation wavelength scanning were also performed at the exit slit of the combustion and flame endstation

the results indicate that the photon intensity of Al-coated grating is better than that of Au-coated one which agrees well with the calculated results.The Au-coated grating has been used for experimental investigation for 3 years

futhermore its lifetime has been larger than that of the replica grating.

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references

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