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1. 重庆大学 低品位能源利用及系统教育部重点实验室,重庆 400030
2. 重庆大学 工程热物理研究所,重庆 400030
收稿日期:2012-01-13,
修回日期:2012-02-21,
网络出版日期:2012-05-10,
纸质出版日期:2012-05-10
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钟年丙, 廖强, 朱恂, 王永忠, 陈蓉. 超声技术在石英光纤腐蚀中的运用[J]. 光学精密工程, 2012,20(5): 988-995
ZHONG Nian-bing, LIAO Qiang, ZHU Xun, WANG Yong-zhong, CHEN Rong. Application of ultrasonic technology to etching silica optical fiber[J]. Editorial Office of Optics and Precision Engineering, 2012,20(5): 988-995
钟年丙, 廖强, 朱恂, 王永忠, 陈蓉. 超声技术在石英光纤腐蚀中的运用[J]. 光学精密工程, 2012,20(5): 988-995 DOI: 10.3788/OPE.20122005.0988.
ZHONG Nian-bing, LIAO Qiang, ZHU Xun, WANG Yong-zhong, CHEN Rong. Application of ultrasonic technology to etching silica optical fiber[J]. Editorial Office of Optics and Precision Engineering, 2012,20(5): 988-995 DOI: 10.3788/OPE.20122005.0988.
为了获得光滑的腐蚀光纤表面并精确管理光纤的腐蚀直径
采用自行设计的超声腐蚀系统
在质量百分比浓度为12.5%的氢氟酸(HF)溶液中研究了超声功率和腐蚀温度对石英光纤包层、纤芯腐蚀速率以及腐蚀后光纤表面形貌的影响。研究表明:在HF溶液中
超声扰动有利于提高光纤的腐蚀速率
光纤腐蚀速率与腐蚀时间呈非线性关系
腐蚀表面随着腐蚀的进行越来越粗糙。基于研究结果
进一步采用质量百分比浓度为12.5%的HF溶液和25% 的NH
4
OH溶液配制了缓冲氢氟酸(BHF)溶液
探讨了光纤腐蚀速率及表面形貌的变化
结果表明:在
V
(HF)∶
V
(NH
4
OH) = 2的BHF溶液中
当超声功率为165 W、腐蚀温度为40℃时
可获得光滑的腐蚀光纤表面和腐蚀速率与腐蚀时间的线性关系。
To obtain the smooth surface of an etched-fiber core and to precisely control the diameter of the etched-fiber
an ultrasonic etching system was developed. The effect of ultrasonic power and temperature on the etch rate of fibers (fiber cladding and fiber core) and the surface morphology of etched-fibers were investigated in the 12.5 % percentage concentration of HF solution
respectively. Experimental results indicate that the etch rate is enhanced by the ultrasonic agitation
the relationship between etch rate and etching time is nonlinear and the surface roughness is increased with the etching time in the HF solution. Thereafter
the Buffered HF (BHF) solution was promoted
and the BHF solutions were prepared by making use of 12.5 % HF solution and 25 % NH
4
OH solution. The influence of BHF solutions on the etch rate and surface morphology was investigated. Obtained results reveal that the smooth surface of etched-fiber core and the linear relationship between etch rate and etching time can be obtained in BHF solution when
V
(HF):
V
(NH
4
OH) is 2
the ultrasonic power is at 165 W and the temperature at 40℃.
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