大尺寸衍射光学元件的扫描离子束刻蚀

邱克强; 周小为; 刘颖; 徐向东; 刘正坤; 盛斌; 洪义麟; 付绍军

doi:10.3788/OPE.20122008.1676

您当前的位置：

首页 >

文章列表页 >

大尺寸衍射光学元件的扫描离子束刻蚀

现代应用光学 | 更新时间：2020-08-12

- 大尺寸衍射光学元件的扫描离子束刻蚀
- Ion beam etching of large aperture diffractive optical elements
- 光学精密工程 2012年20卷第8期页码：1676-1683
- 作者机构：
  
  中国科学技术大学国家同步辐射实验室, 安徽合肥 230029
- 作者简介：
- 基金信息：
  
  国家重大专项(2016ZX04002007)
- DOI：10.3788/OPE.20122008.1676
  中图分类号： O436.1;TN305.2
- 收稿日期：2011-12-11，
  
  修回日期：2012-03-15，
  
  纸质出版日期：2012-08-10
- 稿件说明：
移动端阅览
邱克强, 周小为, 刘颖, 徐向东, 刘正坤, 盛斌, 洪义麟, 付绍军. 大尺寸衍射光学元件的扫描离子束刻蚀[J]. 光学精密工程, 2012,(8): 1676-1683

QIU Ke-qiang, ZHOU Xiao-wei, LIU Ying, XU Xiang-dong, LIU Zheng-kun, SHENG Bin, HONG Yi-lin, FU Shao-jun. Ion beam etching of large aperture diffractive optical elements[J]. Editorial Office of Optics and Precision Engineering, 2012,(8): 1676-1683
邱克强, 周小为, 刘颖, 徐向东, 刘正坤, 盛斌, 洪义麟, 付绍军. 大尺寸衍射光学元件的扫描离子束刻蚀[J]. 光学精密工程, 2012,(8): 1676-1683 DOI： 10.3788/OPE.20122008.1676.

QIU Ke-qiang, ZHOU Xiao-wei, LIU Ying, XU Xiang-dong, LIU Zheng-kun, SHENG Bin, HONG Yi-lin, FU Shao-jun. Ion beam etching of large aperture diffractive optical elements[J]. Editorial Office of Optics and Precision Engineering, 2012,(8): 1676-1683 DOI： 10.3788/OPE.20122008.1676.

摘要

总结了大尺寸衍射光学元件离子束刻蚀技术的研究进展。针对自行研制的KZ-400离子束刻蚀装置

提出了组合石墨束阑结构和多位置分步刻蚀策略来提高离子束刻蚀深度的均匀性

目前在450 mm尺寸内的刻蚀深度均匀性最高可达±1%。建立了针对多层介质膜光栅的衍射强度一维空间分布在线检测系统以及用于透射衍射光学元件离子束刻蚀深度的等厚干涉在线检测系统

实现了对大尺寸衍射光学元件离子束刻蚀终点的定量、科学控制

提高了元件离子束刻蚀工艺的成功率。利用上述技术

成功研制出一系列尺寸的多层介质膜光栅、光束采样光栅、色分离光栅以及同步辐射光栅等多种衍射光学元件。

Abstract

Ion beam etching technologies for developing large aperture Diffractive Optical Elements (DOEs) were reviewed. To meet the requirements of large aperture DOEs in high-power laser systems

an integrated graphite mask for ion beams and a multi-position etching strategy were investigated for a self-established KZ-400 etching facility to improve the uniformity for ion beam etching and the uniformity of ?1% for ion beam current along the major axis of the ion source was achieved in a range of 1430 mm. On-line optical measurement methods and experimental setups for Multilayer Dielectric Gratings (MDGs) and transmission DOEs were presented to measure the 1D spatial distribution of diffraction intensity and the ion beam etching depth based on fringes of equal thickness

respectively

by which the quantitative control of ion beam etching for large size DOEs was completed. Based on above techniques

a series of large aperture DOEs

especially MDGs with diffraction efficiencies more than 95% at 1 064 nm

beam sampling gratings

color separation gratings and beam sampling gratings for synchrotron radiation were fabricated successfully.

关键词

Keywords

references

Lawrence Livermore National Laboratory. Advanced optics:critical and enabling optical technologies . https://lasers.llnl.gov/programs/psa/advanced_optics/ .

Plymouth Grating Laboratory. Technology: scanning-beam interference lithography . http://www.plymouthgrating.com/Technology/Technology Page.htm. .

JITSUNO T, MOTOKOSHI S, OKAMOTO T,et al.. Development of 91 cm size gratings and mirrors for LEFX laser system[J]. J. Phys.:Conf Ser, 2008,112:032002.

邵忠喜,张庆春,白清顺,等. 高精度大口径光栅拼接装置的控制算法[J]. 光学精密工程,2009,17(1):158-165. SHAO ZH X, ZHANG Q CH, BAI Q SH, et al.. Design method of controlling device for tiling high pecision and large aperture grating [J]. Opt. Precision Eng., 2009,17(1):158-165. (in Chinese)

张军伟, 王逍, 林东晖. 大口径光栅拼接架动力响应控制分析[J]. 光学学报,2011,31(1):0112010-1-5. ZHANG J W, WANG X, LIN D H. Dynamic response control and analysis of large aperture tiled grating mount[J]. Acta Optica Sinica, 2011,31(1):0112010-1-5.(in Chinese)

李朝明, 吴建宏, 陈新荣, 等. 脉冲压缩光栅光学拼接方法研究[J]. 光学学报,2009,29(7):1943-1946. LI CH M, WU J H, CH X R, et al.. Research on the multi-exposure method to fabricate pulse compression mosaic grating [J]. Acta Optica Sinica, 2009,29(7):1943-1946.(in Chinese)

石磊. 大尺寸衍射光栅的制造:基于潜像的曝光拼接方法 . 北京:清华大学,2011. SHI L. Fabrication of large-size diffraction gratings: Latent-image-based optical mosaic technique .Beijing: Tsinghua University, 2011.(in Chinese)

NGUYEN H T,BRYAN S R,BRIFTEN J A, et al.. Fabrication of efficient, large aperture transmission diffraction gratings by ion-beam etching . Technical Report, Lawrence Livermore National Laboratory (LLNL), Livermore, 2000, UCRL-ID-140249-REV-1.

KECK J,OLIVER J B,KESSLER T J, et al.. Manufacture and development of multilayer diffraction gratings[J]. SPIE,2005,5991:59911G.

BARTY C P J,KEY M,BRITTEN J, et al.. An overview of LLNL high-energy short-pulse technology for advanced radiography of laser fusion experiments[J]. Nuclear Fusion, 2004,44:S266-S275.

赵光兴, 陈洪, 侯西云, 等. 微加工中一种新型刻蚀深度实时检测系统[J]. 光学学报, 1997,17(6):745-749. ZHAO G X,CHEN H,HOU X Y, et al.. A novel real-time etching depth testing system for micro-fabrication[J]. Acta Optica Sinica, 1997,17(6):745-749. (in Chinese)

徐作冬, 刘颖, 徐向东,等. 衍射光学元件的扫描刻蚀深度在线检测[J]. 微细加工技术,2008(4):19-21,42. XU Z D,LIU Y,XU X D, et al.. On-line etch depth detection of diffractive optical elements[J]. Microfabrication Technology, 2008(4):19-21,42. (in Chinese)

LIN H, LI L F,ZENG L J. In-situ end-point detection during ion-beam etching of multilayer dielectric gratings [J]. Chinese Optics Letters, 2005,3(2):63-65.

徐朝银, 董晓浩, 赵飞云, 等. KZ-400 离子束刻蚀装置的研制[J]. 真空科学与技术学报,2006,26(1):48-53. XU CH Y, DONG X H, ZHAO F Y, et al.. Development of KZ-400 ion beam etching facility[J]. Journal of Vacuum Science and Technology, 2006,26(1):48-53. (in Chinese)

SIEGFRIED D,BUCHHOLTZ B, BURTNER D,et al.. Radio frequency linear ion beam source with 6 cm×66 cm beam [J]. Review of Scientific Instruments,2000,71(2):1029-1031.

HE SH N,LIU Y,ZHU J T, et al.. SiC/W/Ir multilayer-coated grating for enhanced efficiency in 50-100 nm wavelength range in Seya-Namioka mount[J].Opt. Lett., 2011,36(2):163-165.

徐向东,刘正坤,邱克强,等. 同步辐射角分辨光电子能谱光束线1 200 lp/mm光栅研制 [J]. 光学学报, 2011,31(10):1005008-1-5. XU X D,LIU ZH K,QIU K Q, et al.. Fabrication of 1 200 lp/mm laminar gratings for combustion and flame endstation at NSRL [J]. Acta Optica Sinica,2011,31(10):1005008-1-5. (in Chinese)

徐向东, 刘正坤, 邱克强, 等. 国家同步辐射实验室燃烧站用的1 200 lp/mm Laminar光栅研制[J]. 光学精密工程, 2012,20(1):1-8. XU X D,LIU ZH K, QIU K Q, et al.. Fabrication of 1 200 lp/mm laminar gratings for combustion and flame endstation at NSRL [J]. Opt. Precision Eng., 2012,20(1):1-8. (in Chinese)

浏览量

592

下载量

CSCD

文章被引用时，请邮件提醒。

提交

工具集

关联资源

宽束离子束刻蚀快速加工金属纳米间隙结构

用于飞秒激光制备光纤光栅的相位掩模研制

用于强激光系统的光栅偏振器

宽波段全息-离子束刻蚀光栅的设计及工艺

基于解析分区法设计闪耀全息凹面光栅