全息光栅制作中光栅掩模槽形形状随光刻胶特性曲线的演化规律

韩建; 巴音贺希格; 李文昊; 孔鹏

doi:10.3788/OPE.20122011.2380

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全息光栅制作中光栅掩模槽形形状随光刻胶特性曲线的演化规律

现代应用光学 | 更新时间：2020-08-12

- 全息光栅制作中光栅掩模槽形形状随光刻胶特性曲线的演化规律
- Groove profile evolution of grating masks for different photoresist response curves in fabrication of holographic gratings
- 光学精密工程 2012年20卷第11期页码：2380-2388
- 作者机构：
  
  1. 中国科学院大学, 北京 100049,中国
  2. 中国科学院长春光学机密机械与物理研究所,吉林长春 130033
- 作者简介：
- 基金信息：
  
  国家自然科学基金资助项目(No.60478034)();国家创新方法工作专项资助项目(No.2008IM040700)();国家重大科学仪器设备开发专项资助项目(No.
- DOI：10.3788/OPE.20122011.2380
  中图分类号： O436.1;TN305.7
- 收稿日期：2012-04-07，
  
  修回日期：2012-06-16，
  
  纸质出版日期：2012-11-10
- 稿件说明：
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韩建, 巴音贺希格, 李文昊, 孔鹏. 全息光栅制作中光栅掩模槽形形状随光刻胶特性曲线的演化规律[J]. 光学精密工程, 2012,20(11): 2380-2388

HAN Jian, Bayanheshig, LI Wen-hao, KONG Peng. Groove profile evolution of grating masks for different photoresist response curves in fabrication of holographic gratings[J]. Editorial Office of Optics and Precision Engineering, 2012,20(11): 2380-2388
韩建, 巴音贺希格, 李文昊, 孔鹏. 全息光栅制作中光栅掩模槽形形状随光刻胶特性曲线的演化规律[J]. 光学精密工程, 2012,20(11): 2380-2388 DOI： 10.3788/OPE.20122011.2380.

HAN Jian, Bayanheshig, LI Wen-hao, KONG Peng. Groove profile evolution of grating masks for different photoresist response curves in fabrication of holographic gratings[J]. Editorial Office of Optics and Precision Engineering, 2012,20(11): 2380-2388 DOI： 10.3788/OPE.20122011.2380.

摘要

为分析光栅槽形形成的基本原理及槽形随光刻胶特性曲线的演化规律

建立了显影过程中光栅掩模槽形形成的演化模型。基于光刻胶溶解速率在不同曝光量区间的变化

将光刻胶特性曲线分成3个不同区域并分析各区域在光栅掩模槽形形成中的作用

讨论了在不同光刻胶特性曲线条件下光栅掩模槽形的演化规律。结果表明:当光刻胶非线性效应显著时

掩模槽形易形成矩形或梯形

此时槽深由原始胶厚决定;当光刻胶线性效应较显著时

槽形形成正弦形同时槽深有所减小。该模型正确反映了光栅槽形随光刻胶特性曲线变化的演化规律

为通过控制光刻胶特性曲线制作多种掩模槽形提供了理论依据及方法。

Abstract

To analyze the principle of profile formation for grating masks and the evolution of photoresist response curves

a simulation model of profile formation for grating masks in development was established. Based on the difference of photoresist dissolution rate in the different regions

the complete photoresist curve was divided into three sections

the effect of each section in the profile formation of grating masks was analyzed

then the simulation surface-relief profile model was presented. The experimental results indicate that the groove profile inclines to be rectangular or trapezoidal when the nonlinearity of photoresist response curve is remarkable

and the groove depth is mainly decided by the initial photeresist thickness. The groove profile is sinusoidal when the linearity response is strong

and the groove depth is also always decreased under this condition. The experiment shows that the proposed model can predict the profile evolution for the different photoresist curves and it provides a directive theory for fabricating the various profile masks during development according to the different photoresist response curves.

关键词

Keywords

references

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