零阿贝误差的纳米三坐标测量机工作台及误差分析

黄强先; 余夫领; 宫二敏; 王晨晨; 费业泰

doi:10.3788/OPE.20132103.0664

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零阿贝误差的纳米三坐标测量机工作台及误差分析

微纳技术与精密机械 | 更新时间：2020-08-12

- 零阿贝误差的纳米三坐标测量机工作台及误差分析
- Nano-CMM stage with zero Abbe error and its error analysis
- 光学精密工程 2013年21卷第3期页码：664-671
- 作者机构：
  
  合肥工业大学仪器科学与光电工程学院,安徽合肥,230009
- 作者简介：
- 基金信息：
  
  国家高技术研究发展计划（863计划）重点资助项目()
- DOI：10.3788/OPE.20132103.0664
  中图分类号： TH72;TH711
- 收稿日期：2012-11-06，
  
  修回日期：2012-12-30，
  
  网络出版日期：2013-03-20，
  
  纸质出版日期：2013-03-15
- 稿件说明：
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黄强先余夫领宫二敏王晨晨费业泰. 零阿贝误差的纳米三坐标测量机工作台及误差分析[J]. 光学精密工程, 2013,21(3): 664-671

HUANG Qiang-xian YU Fu-ling GONG Er-min WANG Cheng-cheng FEI Ye-tai. Nano-CMM stage with zero Abbe error and its error analysis[J]. Editorial Office of Optics and Precision Engineering, 2013,21(3): 664-671
黄强先余夫领宫二敏王晨晨费业泰. 零阿贝误差的纳米三坐标测量机工作台及误差分析[J]. 光学精密工程, 2013,21(3): 664-671 DOI： 10.3788/OPE.20132103.0664.

HUANG Qiang-xian YU Fu-ling GONG Er-min WANG Cheng-cheng FEI Ye-tai. Nano-CMM stage with zero Abbe error and its error analysis[J]. Editorial Office of Optics and Precision Engineering, 2013,21(3): 664-671 DOI： 10.3788/OPE.20132103.0664.

摘要

为避免常规三坐标测量机（CMM）中的阿贝误差，同时降低导轨运动误差对测量机测量不确定度的影响，研制了一种在三维测量方向上同时符合阿贝原则的纳米CMM工作台。该工作台做三维运动，x导轨和y导轨采用共平面结构；工作台三维测量系统的测量线正交于一点且正交点与测头中心点重合，x向和y向测量系统的测量线与xy导轨面共面。针对本工作台的特点，在参考常规三坐标测量机误差分析的基础上，详细分析了该工作台中各项误差的影响，给出了影响测量机不确定度的主要误差源，并对这些误差提出了修正方法。在研制的工作台上对一等量块进行了实验测试。结果显示，一等量块工作面的平面度测量标准差为11 nm，台阶高度标准差为21 nm，其中台阶高度测量平均值与检定值相差1 nm。理论分析和实验结果表明，所研制的工作台从结构上避免了CMM中多项误差源的影响，尤其是避免了阿贝误差的影响，可用于高精度的三维测量。

Abstract

A new type nanometer Coordinate Measuring Machine(CMM) stage which meets the Abbe principle in three-dimensional directions is proposed to avoid the Abbe error in conventional CMMs and reduce the guide motion error that influences on the nano-CMM measurement uncertainty. The stage can move in three dimensional directions and its x guide and y guide are in a coplanar structure. The three measuring lines of the stage are orthogonal and intersect at one point which coincides with the center of a probe. Moreover

the measuring lines of x measurement system and y measurement system are coplanar with the plane of the xy stage. According to the characteristics of this stage

the impacts of various errors on the stage are analyzed

the main source errors to the measurement uncertainty are given and new correction methods for those errors are proposed. Finally

two pieces of first gauge block are measured on the developed stage. Measurement results show that the standard deviation of flatness error of first gauge block working surface is 11 nm

and that of step height is about 21 nm and the difference between the average of step heights and the calibrated value is about 1 nm. The theoretical analysis and experiment show that the nano-CMM avoids the impact of various error sources

especially the impact of Abbe error

and can be used in high-precision three-dimensional measurement.

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Keywords

references

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