光刻投影物镜中透镜X-Y柔性微动调整机构

赵磊; 巩岩; 赵阳

doi:10.3788/OPE.20132106.1425

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光刻投影物镜中透镜X-Y柔性微动调整机构

微纳技术与精密机械 | 更新时间：2020-08-12

- 光刻投影物镜中透镜X-Y柔性微动调整机构
- Flexure-based X-Y micro-motion mechanism used in lithography lens
- 光学精密工程 2013年21卷第6期页码：1425-1433
- 作者机构：
  
  中国科学院长春光学精密机械与物理研究所,吉林长春,130033
- 作者简介：
- 基金信息：
  
  国家重大专项02专项()
- DOI：10.3788/OPE.20132106.1425
  中图分类号： TH74;TN305.7
- 收稿日期：2012-04-12，
  
  修回日期：2012-06-20，
  
  网络出版日期：2013-06-20，
  
  纸质出版日期：2013-06-15
- 稿件说明：
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赵磊巩岩赵阳. 光刻投影物镜中透镜X-Y柔性微动调整机构[J]. 光学精密工程, 2013,21(6): 1425-1433

ZHAO 赵 GONG Yan ZHAO Yang. Flexure-based X-Y micro-motion mechanism used in lithography lens[J]. Editorial Office of Optics and Precision Engineering, 2013,21(6): 1425-1433
赵磊巩岩赵阳. 光刻投影物镜中透镜X-Y柔性微动调整机构[J]. 光学精密工程, 2013,21(6): 1425-1433 DOI： 10.3788/OPE.20132106.1425.

ZHAO 赵 GONG Yan ZHAO Yang. Flexure-based X-Y micro-motion mechanism used in lithography lens[J]. Editorial Office of Optics and Precision Engineering, 2013,21(6): 1425-1433 DOI： 10.3788/OPE.20132106.1425.

摘要

针对光刻投影物镜中透镜X-Y调整机构调整量程小、调整精度高的特点，提出了一种基于柔性铰链的X-Y微动调整机构，并将其应用在光刻投影物镜模型中进行了实验验证。首先，基于机构自由度和机构瞬心等概念介绍了该机构的工作原理。然后，用柔性铰链代替传统铰链完成了该机构的结构设计，并对该机构的运动方向刚度、位移输入-输出比以及固有频率和阵型等进行了仿真分析。分析结果表明：该机构X，Y方向的刚度值为1.99 m/N和1.96 m/N，X，Y方向的位移输入-输出比值分别为-2.5和-2.56，机构X，Y方向运动的原理误差分别为实际量的8.22％和6.68％。最后，将研制的X-Y微动调整机构用于光刻投影物镜验证模型中，给出了X-Y调整机构补偿前后的系统波像差。结果显示：模型补偿前后的系统波像差RMS分别为50.864 nm和25.933 nm。由此表明，本文设计的柔性微动调整机构补偿效果明显，能够满足光刻投影物镜高精度X-Y调整补偿要求。

Abstract

A novel X-Y micro-motion mechanism was proposed based on a flexure hinge to meet the demand of the lithographic lens for X-Y adjusting mechanism with a small range and a high precision

then it was applied to the lithographic lens model to testify its performance. Firstly

the working principle of the mechanism was introduced based on the concept of mechanism degree of freedom(DOF) and instant center. Then

the structure of the mechanism was designed by using the flexure hinge instead of tradition hinge and the motion rigidity of mechanism

the ratio of input and output for displacement and its natural frequency and modes were all analyzed. The analysis results show that the rigidity values of mechanism X and Y are 1.99 m/N and 1.96 m/N respectively

the ratio of input and output for displacement in X and Y axes are -2.5 and -2.56

respectively

and the principle errors in X and Y axes are 8.22％ and 6.68％

respectively of its useful displacement. Finally

the mechanism was used in the lithographic lens systems to prove its performance

and the wavefront aberrations of the lens system were tested. The experiment results indicate that the wavefront aberrations of the systems before and after the mechanism adjusting compensations are 50.864 nm and 25.933 nm respectively. The X-Y flexural mechanism has good performance of aberration compensation

and it can satisfy the requirements of lithographic lens for high precision X-Y micro adjusting.

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references

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