基于遮挡矩阵的膜厚修正挡板的设计

张立超; 高劲松

doi:10.3788/OPE.20132111.2757

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基于遮挡矩阵的膜厚修正挡板的设计

现代应用光学 | 更新时间：2020-08-12

- 基于遮挡矩阵的膜厚修正挡板的设计
- Design of uniformity correction masks based on shadow matrix
- 光学精密工程 2013年21卷第11期页码：2757-2763
- 作者机构：
  
  1. 中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春,130033
  2. 中国科学院长春光学精密机械与物理研究所中科院光学系统先进制造技术重点实验室,吉林长春,130033
- 作者简介：
- 基金信息：
  
  XXX技术研究()
- DOI：10.3788/OPE.20132111.2757
  中图分类号： O484.1
- 收稿日期：2012-09-06，
  
  修回日期：2012-09-29，
  
  网络出版日期：2013-11-22，
  
  纸质出版日期：2013-11-15
- 稿件说明：
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张立超, 高劲松. 基于遮挡矩阵的膜厚修正挡板的设计[J]. 光学精密工程, 2013,21(11): 2757-2763

ZHANG Li-chao, GAO Jin-song. Design of uniformity correction masks based on shadow matrix[J]. Editorial Office of Optics and Precision Engineering, 2013,21(11): 2757-2763
张立超, 高劲松. 基于遮挡矩阵的膜厚修正挡板的设计[J]. 光学精密工程, 2013,21(11): 2757-2763 DOI： 10.3788/OPE.20132111.2757.

ZHANG Li-chao, GAO Jin-song. Design of uniformity correction masks based on shadow matrix[J]. Editorial Office of Optics and Precision Engineering, 2013,21(11): 2757-2763 DOI： 10.3788/OPE.20132111.2757.

摘要

为了在光学元件镀膜过程中精确控制膜厚均匀性，通常需要有针对性地设计并制作膜厚修正挡板。然而，由于基底在真空室内运动方式复杂，实际工作中通常采用多次试验，反复进行局部修正的方法来确定挡板形状。为解决这一问题，本文提出了遮挡矩阵的概念。基于这一概念，提出了膜厚修正挡板的设计方法。通过对挡板进行合理的划分，对膜厚空间分布与挡板形状建立起精确的定量关系，从而可在不需进行事后修正的情况下，准确计算出修正挡板的形状。针对平面行星夹具，设计并制作了膜厚修正挡板，在300 mm的口径上实现了膜厚均匀性的PV值优于0.3%、rms值优于0.1%。这些结果验证了这一方法的有效性，表明该方法满足光学元件镀膜过程中高效、可靠地调整膜厚均匀性的要求。

Abstract

To control the thickness distribution accurately in optical coatings for optical elements

correction masks should be designed according to details of coating machines and substrates. However

the shapes of correction masks are hard to predict for restrictions from many factors. Normally

a laborious method is used to correct masks by slightly adjusting their shapes repeatedly. To solve this problem

the concept of the shadow matrix was proposed. Based on this concept

a design method of correction masks for coating thickness was proposed. The relation between thickness distribution and mask shape was established based on partitioning of the mask reasonably. Therefore

mask shapes could be derived without additional mending processes. A uniformity mask was designed and manufactured for a planetary fixture by using this method. Experiments show that the measured uniformity is better than 0.3% PV or 0.1% rms on the range of 300 mm. The results prove the validity of this method and indicate that it can meet the requirement of optical elements in coating processing for adjusting thickness uniformity in higher efficiency and reliability.

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references

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