热处理对离子束溅射Ta2O5薄膜特性的影响

刘华松; 姜承慧; 王利栓; 刘丹丹; 季一勤; 陈德应

doi:10.3788/OPE.20142210.2645

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热处理对离子束溅射Ta₂O₅薄膜特性的影响

现代应用光学 | 更新时间：2020-08-13

- 热处理对离子束溅射Ta₂O₅薄膜特性的影响
- Effects of annealing on properties of Ta₂O₅ thin films deposited by ion beam sputtering
- 光学精密工程 2014年22卷第10期页码：2645-2651
- 作者机构：
  
  1. 中国航天科工飞航技术研究院天津津航技术物理研究所天津,300192
  2. 哈尔滨工业大学光电子技术研究所可调谐激光技术国家级重点实验室,黑龙江哈尔滨,150080
- 作者简介：
- 基金信息：
  
  国家自然科学基金重点项目(No.61405145,No.61235011)();中国博士后科学基金资助项目(No.2014M560104)();天津市自然科学基金资助项
- DOI：10.3788/OPE.20142210.2645
  中图分类号： O484.1
- 收稿日期：2013-11-18，
  
  修回日期：2014-01-08，
  
  纸质出版日期：2014-10-25
- 稿件说明：
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刘华松, 姜承慧, 王利栓等. 热处理对离子束溅射Ta2O5薄膜特性的影响[J]. 光学精密工程, 2014,22(10): 2645-2651

LIU Hua-song, JIANG Cheng-hui, WANG Li-shuan etc. Effects of annealing on properties of Ta2O5 thin films deposited by ion beam sputtering[J]. Editorial Office of Optics and Precision Engineering, 2014,22(10): 2645-2651
刘华松, 姜承慧, 王利栓等. 热处理对离子束溅射Ta2O5薄膜特性的影响[J]. 光学精密工程, 2014,22(10): 2645-2651 DOI： 10.3788/OPE.20142210.2645.

LIU Hua-song, JIANG Cheng-hui, WANG Li-shuan etc. Effects of annealing on properties of Ta2O5 thin films deposited by ion beam sputtering[J]. Editorial Office of Optics and Precision Engineering, 2014,22(10): 2645-2651 DOI： 10.3788/OPE.20142210.2645.

摘要

利用离子束溅射沉积技术制备了Ta

薄膜

在100~600 ℃的大气氛围中对其进行热处理(步进温度为100 ℃)

并对热处理后样品的光学常数(折射率、折射率非均匀性、消光系数和物理厚度)、应力、晶向和表面形貌进行了研究.研究显示

随着热处理温度增加

薄膜折射率整体呈下降趋势

折射率非均匀性和物理厚度呈增加趋势

结果有效地改善了薄膜的消光系数和应力

但薄膜的晶向和表面形貌均未出现明显的变化.结果表明:热处理可以有效改变薄膜特性

但需要根据Ta

薄膜具体应用综合选择最优的热处理温度.本文对离子束溅射Ta

薄膜的热处理参数选择具有指导意义.

Abstract

films were deposited by Ion Beam Sputtering (IBS) technique and they were annealed in air at the temperatures from 100 ℃ to 600 ℃ with a step of 100 ℃. Then the optical constants after annealing (refractive index

the inhomogeneity of refractive index

extinction coefficient and physical thickness)

stress

crystalline and surface morphology were systematically studied. The experimental results indicate that with the annealing temperature increasing

the refractive indexes of the films decrease in the mass and the inhomogeneity of refractive index and the film thickness increase

by which the extinction coefficient and stress are improved. However

the crystal orientation and surface morphology of the films are no significant change. These results demonstrate that the thermal processing changes the characteristics of films but the thermal processing temperature for Ta

films should be selected based on the application demands. These results will be a reference for parameter selection in Ta

film deposition by the IBS.

关键词

Keywords

references

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