真空紫外Al/MgF2反射镜

王风丽; 周东伟; 张金帅; 王占山

doi:10.3788/OPE.20152304.0913

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真空紫外Al/MgF₂反射镜

现代应用光学 | 更新时间：2020-08-13

- 真空紫外Al/MgF₂反射镜
- Al/MgF₂ mirrors in vacuum ultraviolet region
- 光学精密工程 2015年23卷第4期页码：913-918
- 作者机构：
  
  同济大学物理科学与工程学院教育部先进微结构材料重点实验室上海,200092
- 作者简介：
- 基金信息：
  
  国家重大科学研究计划资助项目(No.2011CB922203)();上海科委纳米专项资助项目(No.11nm0507200)()
- DOI：10.3788/OPE.20152304.0913
  中图分类号： O484.4;TH703
- 收稿日期：2014-07-07，
  
  修回日期：2014-09-01，
  
  纸质出版日期：2015-04-25
- 稿件说明：
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王风丽, 周东伟, 张金帅等. 真空紫外Al/MgF2反射镜[J]. 光学精密工程, 2015,23(4): 913-918

WANG Feng-li, ZHOU Dong-wei, ZHANG Jin-shuai etc. Al/MgF2 mirrors in vacuum ultraviolet region[J]. Editorial Office of Optics and Precision Engineering, 2015,23(4): 913-918
王风丽, 周东伟, 张金帅等. 真空紫外Al/MgF2反射镜[J]. 光学精密工程, 2015,23(4): 913-918 DOI： 10.3788/OPE.20152304.0913.

WANG Feng-li, ZHOU Dong-wei, ZHANG Jin-shuai etc. Al/MgF2 mirrors in vacuum ultraviolet region[J]. Editorial Office of Optics and Precision Engineering, 2015,23(4): 913-918 DOI： 10.3788/OPE.20152304.0913.

摘要

采用三步热舟蒸发制作法研制了真空紫外Al/MgF

反射镜

研究了改善制备工艺有效提升反射率的方法。在两层Al/MgF

反射镜制备过程中

第一步在室温石英基板上快速蒸发厚约70 nm的铝膜;第二步在铝膜表面迅速蒸发厚约10 nm的MgF

;第三步先对基板加热到一定温度后

再在Al+MgF

的表面上蒸发15~20 nm厚的MgF

。通过调整基板温度(室温、100 ℃、200 ℃和300 ℃)

研究了基板温度对Al/MgF

反射率的影响。真空紫外反射率计测试结果表明:第二步蒸镀MgF

之后增加基板温度有利于提高反射镜的反射率;MgF

薄膜的厚度对反射镜的反射率起到一定的调制作用

MgF

厚为26.7 nm的反射镜在122 nm处的反射率达85%。在实验室环境下存放1个月和5个月后

反射镜的反射率没有变化。研究结果为真空紫外光学系统需求的高性能光学元件的研制提供了技术基础。

Abstract

Al/MgF

mirrors in vacuum ultraviolet region were developed by three step thermal boat evaporation method

and a method to improve the reflectivity of mirrors by fabrication technology was explored. There are three steps to fabricate the two layers Al/MgF

mirrors. In the first step

an aluminum coating with a thickness about 70 nm was evaporated on a quartz substrate at the room temperature. And then

the MgF

coating with a thickness about 10 nm was quickly evaporated on an aluminum coating. In the third step

the substrate was heated to certain temperature

and the MgF

coating with a thickness of 15-20 nm was evaporated on the surface of the Al and MgF

coatings. According to changes of the substrate temperatures at the room temperature

100

200 and 300 ℃

the effects of the substrate temperatures on the mirror reflectivity were researched. The results measured by a vacuum ultraviolet reflector show that improving the substrate temperature after evaporating MgF

is in favour of increasing the reflectivity of Al/MgF

mirror and the thickness of the Al/MgF

is related to the reflectivity of the mirror. When the thickness of MgF

is 26.7 nm

the reflectivity at 122 nm is about 85%. The reflectivity of the mirrors stored in the laboratory is barely changed after one month and five months. The results provide technological function for higher performance optical elements in vacuum ultraviolet optical systems.

关键词

Keywords

references

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