基于闪耀光栅图形化实现高分辨率干涉光刻

胡进; 董晓轩; 浦东林; 申溯; 陈林森

doi:10.3788/OPE.20152312.3335

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基于闪耀光栅图形化实现高分辨率干涉光刻

现代应用光学 | 更新时间：2020-08-13

- 基于闪耀光栅图形化实现高分辨率干涉光刻
- High resolution pattern-integrated interference lithography based on blazed grating
- 光学精密工程 2015年23卷第12期页码：3335-3342
- 作者机构：
  
  1. 苏州大学物理与光电·
  2. 能源学部,江苏苏州,215006
- 作者简介：
- 基金信息：
  
  国家自然科学基金重大研究计划资助项目(No.91323303)()
- DOI：10.3788/OPE.20152312.3335
  中图分类号： O436.1;TN305.7
- 修回日期：2015-07-10，
  
  纸质出版日期：2015-12-25
- 稿件说明：
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胡进, 董晓轩, 浦东林等. 基于闪耀光栅图形化实现高分辨率干涉光刻[J]. 光学精密工程, 2015,23(12): 3335-3342

HU Jin, DONG Xiao-xuan, PU Dong-lin etc. High resolution pattern-integrated interference lithography based on blazed grating[J]. Editorial Office of Optics and Precision Engineering, 2015,23(12): 3335-3342
胡进, 董晓轩, 浦东林等. 基于闪耀光栅图形化实现高分辨率干涉光刻[J]. 光学精密工程, 2015,23(12): 3335-3342 DOI： 10.3788/OPE.20152312.3335.

HU Jin, DONG Xiao-xuan, PU Dong-lin etc. High resolution pattern-integrated interference lithography based on blazed grating[J]. Editorial Office of Optics and Precision Engineering, 2015,23(12): 3335-3342 DOI： 10.3788/OPE.20152312.3335.

摘要

为提高图形化干涉光刻质量

提出了基于闪耀光栅的图形化干涉光刻(PIIL)系统

并对该系统所采用的光学原理和实现方法进行了研究。首先

分析了图形化干涉光刻系统的光场特性

阐述了其分辨率提升的原理。讨论了光学系统带宽和图案分布对光刻图形质量的影响

给出了图形质量控制的工艺方法。其次

提出了一种新型的图形化干涉光刻方法

该方法采用闪耀光栅作为衍射分光器件

实现了位相和振幅的一体化调制。采用数值计算方法模拟了闪耀光栅的衍射特性和像面光场分布

讨论了闪耀光栅的优化设计方法

获得了高达92.3%的±1级衍射效率。最后

基于数字微镜器件(DMD)和微缩成像光路设计开发了图形化干涉光刻系统

实验获得了像素化的点阵图形和质量明显改善的光刻图像

验证了该方法对任意图形的适用性。

Abstract

To improve the quality of pattern interference lithography

a Pattern-integrated Interference Lithographic( PIIL) system based on a blazed grating was proposed

and the theory of optical system and the method to realize a high quality pattern were investigated. Firstly

the optical field properties of the typical PIIL system were analyzed and how to improve the resolution of the system was described. The influences of the system bandwidth and the pattern feature on the image quality were discussed and the process technique to enhance the pattern uniformity in the interference exposure was given. Then

a novel pattern-integrated interference lithographic method was proposed. The blaze grating was used as a diffraction beam splitter to realize the integration of phase and amplitude modulation and the numerical calculation was used to simulate the diffraction properties of the blazed grating and the optical field distribution on an image plane. The parameter optimization of the blazed grating was discussed and the diffraction efficiency up to 92.3% was obtained for ±1 order. Finally

the pattern-integrated interference exposure system was presented based on a Digital Mirror Device(DMD)

a micro imaging path and the patterns of pixelated dot-matrix were obtained and the quality of pattern of interference lithography was improved markedly. The results verify the applicability of the method for arbitrary structures.

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references

GREENWAY R T,HENDELL R,JEONG K,et al.. Interference assisted lithography for patterning of 1D gridded design [J].SPIE, 2009, 7271:72712U.

精工爱普生株式会社.微细结构体的制造方法、曝光装置、电子仪器:中国CN 1740915A[P].2005. Seiko Epson Corporation. Fabrication method of microstructure,exposure system and electronic instruments:CHINA PATENT:1740915A[P].2005. (in Chinese)

孙刘杰,庄松林. 基于同轴菲涅耳全息的标识印刷防伪技术[J]. 中国激光,2007,34(3) :402-405. SUN L J, ZHUANG S L.Identification mark of encrypted in-line Fresnel holography [J]. Chinese Journal of Lasers,2007,34(3):402-405.(in Chinese)

WANG L,TERHALLE B,GUZENKO V A, et al.. Generation of high-resolution kagome lattice structures using extreme ultraviolet interference lithography [J]. Appl. Phys. Lett., 2012,101(9):093104.

HIROO K. Current status of EUV lithography [J].Opt. Precision Eng., 2001, 9(5):435-441.

CHEN B, NI Q L, CAO J L. Development of debris-free laser plasma sources for EUV lithography in CIOMP [J]. Opt. Precision Eng.,2001, 9(5):442-445.

MONTOYA J C,CHANG CH H, HEILMANN R K, et al.. Doppler writing and line width control for scanning beam interference lithography [J]. J. Vac. Sci. Technol.,2005, B23(6):2641-2645.

PATI G S,HEILMANN R K,KONKOLA P T, et al.. A generalized scanning beam interference lithography system for patterning gratings with variable period progressions [J]. J. Vac. Sci. Technol., 2002, B20(6): 2617-2621.

ZAIDI S H,BRUECK S R. Multiple-exposure interferometric lithography [J]. J. Vac. Sci. Technol., 1993, B11(3): 658-662.

LANGNER A,PÄIVÄNRANTA B, TERHALLE B, et al.. Fabrication of quasi periodic nanostructures with EUV interference lithography[J].Int. J. Nanotechnol., 2012, 23:105303.

BENTLEY S J. Nonlinear interferometric lithography for arbitrary two-dimensional patterns [J]. J. Micro/Nanolith. MEMS MOEMS, 2008, 7(1):013004.

NAYDENOVA L. Holograms-Recording Materials and Applications[M]. InTech Press, 2011:77-80.

吴智华,魏国军,周小红,等. 采用DMD并行输入的激光干涉直写方法[J]. 激光与红外,2008,38(5): 424-428. WU ZH H, WEI G J, ZHOU X H, et al.. A way of parallel interferential laser direct writing with DMD [J].Laser & Infrared, 2008,38(5): 424-428.(in Chinese)

胡进,浦东林,陈林森,等. 基于衍射光栅和空间光调制器的点阵全息光刻方法[J]. 中国激光,2014,41(6):35-39. HU J, PU D L, CHEN L S, et al.. A method of dot-matrix holography based on the diffraction grating and spatial light modulator [J].Chinese Journal of Lasers,2014,41(6):35-39.(in Chinese)

GAYLORD T K,LEIBOVICI M C R,BURROW G M. Pattern-integrated interference [J]. Appl. Opt., 2013, 52(1):61-72.

BURROW G M,LEIBOVICI M C R,GAYLORD T K. Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures [J]. Appl. Opt., 2012, 51(18):4028-4041.

LEVENSON M D.Improving resolution in photolithography with a phase-shifting mask[J].IEEE Transactions on Electron Devices,1982,29(12):1828-1836.

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