微缩投影系统的垂轴放大率测量

谢耀; 王丽萍; 郭本银; 王君; 苗亮; 王辉; 周烽

doi:10.3788/OPE.20162401.0001

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微缩投影系统的垂轴放大率测量

现代应用光学 | 更新时间：2020-08-13

- 微缩投影系统的垂轴放大率测量
- Measurement of transversal magnification for reduced projection system
- 光学精密工程 2016年24卷第1期页码：1-6
- 作者机构：
  
  中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春,130033
- 作者简介：
- 基金信息：
  
  国家科技重大专项基金资助项目(No.2008ZX02501-008)()
- DOI：10.3788/OPE.20162401.0001
  中图分类号： TH703;TH741.5
- 收稿日期：2015-08-11，
  
  修回日期：2015-09-10，
  
  纸质出版日期：2016-01-25
- 稿件说明：
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谢耀, 王丽萍, 郭本银等. 微缩投影系统的垂轴放大率测量[J]. 光学精密工程, 2016,24(1): 1-6

XIE Yao, WANG Li-ping, GUO Ben-yin etc. Measurement of transversal magnification for reduced projection system[J]. Editorial Office of Optics and Precision Engineering, 2016,24(1): 1-6
谢耀, 王丽萍, 郭本银等. 微缩投影系统的垂轴放大率测量[J]. 光学精密工程, 2016,24(1): 1-6 DOI： 10.3788/OPE.20162401.0001.

XIE Yao, WANG Li-ping, GUO Ben-yin etc. Measurement of transversal magnification for reduced projection system[J]. Editorial Office of Optics and Precision Engineering, 2016,24(1): 1-6 DOI： 10.3788/OPE.20162401.0001.

摘要

考虑有限距光学系统的成像质量与系统垂轴放大率相关

本文提出了基于系统波像差检测的垂轴放大率测量方案。以给定的光学系统中像平面位置与物平面位置满足高斯公式和牛顿公式的原理为出发点

通过系统波像差中离焦量的变化监控物点移动微小量后像点的移动距离。然后

对牛顿公式或高斯公式微分导出轴向放大率

最终求出系统垂轴放大率。建立了垂轴放大率测量模型

给出物点的微小位移量和初始离焦量的选取标准

并系统地分析了光学元件形位公差和像点定位精度对垂轴放大率测量结果的影响。搭建了基于点衍射干涉仪的微缩投影系统波像差检测平台

测量了系统的垂轴放大率。实验显示

系统垂轴放大率的测量值与理论值的偏差优于0.24%

验证了提出的垂轴放大率测量方法的可行性和理论分析的准确性。

Abstract

As the imaging performance of an optical system is related to its transversal magnification

this paper proposes a transversal magnification measurement scheme based on wavefront error metrology for the optical system. On the basis of that the locations of image plane and object plane satisfy the Newton's and Gauss's formulas in a given optical system

the defocus in wavefront error was used to monitor the movement of image point. According to the minor movement of object point

the longitudinal magnification could be calculated by the differential of Newton's and Gauss's formulas

and the transversal magnification was obtained finally. In order to validate the scheme

a model of transversal magnification measurement was established

and the criterions of the object point shift and the initial defocus were summarized. Then

the influences of geometric tolerance and positioning accuracy of the image point on transversal magnification were analyzed. Finally

an experimental platform based on a point diffraction interferometer was established for measuring the wavefront error of a reduced projection system

and the transversal magnification of the system was measured. It shows that the difference between theoretical and measured results is lower than 0.24%

which verifies the feasibility and veracity of this scheme.

关键词

Keywords

references

金春水,王占山,曹健林. 软X射线投影光刻原理装置的设计[J]. 光学精密工程,2000,8(1): 66-70. JIN CH SH, WANG ZH SH, CAO J L. The design of soft x-ray projection lithography [J]. Opt. Precision Eng., 2000, 8(1): 66-70.(in Chinese)

王丽萍. 极紫外投影光刻光学系统[J]. 中国光学与应用光学,2010,3(5):452-461. WANG L P. Optical system of extreme ultraviolet lithography [J]. Chinese Journal of Optics and Applied Optics, 2010, 3(5): 452-461.(in Chinese)

王君,金春水,王丽萍,等. 极紫外光刻投影物镜中多层膜分析模型的建立及应用[J]. 光学学报, 2014,34(8):0811002. WANG J, JIN CH SH, WANG L P, et al.. Foundation and application of model for multilayers analysis in extreme ultra-violet lithography projection [J]. Acta Optica Sinica,2014,34(8):0811002.(in Chinese)

赵阳,巩岩. 投影物镜小比率模型系统补偿量的选择[J]. 光学精密工程, 2013, 21(12):3029-3036. ZHAO Y, GONG Y. Selection of system compensators for small scale projected objective [J]. Opt. Precision Eng., 2013, 21(12): 3029-3036.(in Chinese)

许伟才,黄玮,杨旺. 投影光刻物镜倍率的公差分析与补偿[J]. 光学学报,2011,31(11):1122003. XU W C, HUANG W, YANG W. Magnification tolerancing and compensation for the lithographic projection lens [J]. Acta Optica Sinica, 2011,31(11):1122003.(in Chinese)

刘秉琦,沈学举. CCD测望远系统放大率[J]. 光电工程, 1998, 25(3):70-72. LIU B Q, SHEN X J. Measurement of the magnification of the telescopic system with CCD [J]. Opto-Electronic Engineering, 1998, 25(3):70-72.(in Chinese)

汪伟,尚长水,谭显祥. 转镜分幅相机中分幅系统放大倍率的校正[J]. 应用光学, 2008, 29(5):708-712. WANG W, SHANG CH SH, TAN X X. Correction of transversal magnification for framing system in high-speed rotating mirror framing camera [J]. Journal of Applied Optics, 2008, 29(5):708-712.(in Chinese)

郭羽,杨红,杨照金,等. CCD摄像系统镜头的畸变测量[J]. 应用光学, 2008, 29(2):279-282. GUO Y, YANG H, YANG ZH J, et al.. Distortion measurement of lens in CCD camera system [J]. Journal Applied Optics, 2008, 29(2):279-282.(in Chinese)

JEFFREY B, PATRICK N. System for interferometric distortion measurements that define an optical path:United States Patent, US 6559952 B1 [P].2003-05-06.

MICHAEL S. System for correcting aberrations and distortions in EUV lithography: United States Patent, US 6897940 B2 [P].2005-05-24.

郁道银,谈恒英. 工程光学[M]. 北京:机械工业出版社, 1999: 24-26. YU D Y, TAN H Y. Engineering Optics [M]. Beijing:China Machine Press, 1999: 24-26.(in Chinese)

马拉卡拉 D. 光学车间检测[M]. 杨力等,译. 北京:机械工业出版社, 2012: 369-405. MALACARA D. Optical Shop Testing [M]. YANG L et al.,Transl.. Beijing:China Machine Press, 2012: 369-405.(in Chinese)

谢耀,于杰,王丽萍,等. 微缩投影系统的计算机辅助装调[J]. 光学精密工程, 2014, 22(8): 2103-2108. XIE Y, YU J, WANG L P, et al.. Computer-aided alignment for reduced projection systems[J]. Opt. Precision Eng., 2014, 22(8): 2103-2108.(in Chinese)

代晓珂,金春水,于杰. 点衍射干涉仪波面参考源误差及公差分析[J]. 中国光学, 2014, 7(5):855-862. DAI X K, JIN CH SH, YU J. Analysis on error and tolerance for the wavefront reference source of point diffraction interferometer[J]. Chinese Optics, 2014, 7(5):855-862.(in Chinese)

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