拼接干涉技术在同步辐射领域的发展现状及趋势

刘丁枭; 盛伟繁; 王秋实; 李明

doi:10.3788/OPE.20162410.2357

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拼接干涉技术在同步辐射领域的发展现状及趋势

现代应用光学 | 更新时间：2020-07-07

- 拼接干涉技术在同步辐射领域的发展现状及趋势
- Current status and trends of stitching interferometry in synchrotron radiation field
- 光学精密工程 2016年24卷第10期页码：2357-2369
- 作者机构：
  
  中国科学院高能物理研究所北京同步辐射装置X射线光学与技术实验室, 北京 100049
- 作者简介：
  
  [ "刘丁枭(1990-),男,河北衡水人,博士研究生,2013年于北京化工大学获得学士学位,主要从事高精度面形光学元件检测装置的研究。E-mail:liudx@ihep.ac.cn" ]
  盛伟繁(1962-),男,黑龙江哈尔滨人,研究员,1984年、1987年于哈尔滨工业大学分别获得学士、硕士学位,1994-1996年在美国阿贡国家实验室、2001年-2002年在加拿大光源做访问学者,主要从事同步辐射光学及光束线技术的研究。E-mail:shengwf@ihep.ac.cn
- 基金信息：
  
  国家自然科学基金青年基金资助项目(No.11005123)
- DOI：10.3788/OPE.20162410.2357
  中图分类号： TH744.3
- 收稿日期：2016-08-10，
  
  录用日期：2016-8-26，
  
  纸质出版日期：2016-10
- 稿件说明：
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刘丁枭, 盛伟繁, 王秋实, 等. 拼接干涉技术在同步辐射领域的发展现状及趋势[J]. 光学精密工程, 2016,24(10):2357-2369.

Ding-xiao LIU, Wei-fan SHENG, Qiu-shi WANG, et al. Current status and trends of stitching interferometry in synchrotron radiation field[J]. Optics and precision engineering, 2016, 24(10): 2357-2369.
刘丁枭, 盛伟繁, 王秋实, 等. 拼接干涉技术在同步辐射领域的发展现状及趋势[J]. 光学精密工程, 2016,24(10):2357-2369. DOI： 10.3788/OPE.20162410.2357.

Ding-xiao LIU, Wei-fan SHENG, Qiu-shi WANG, et al. Current status and trends of stitching interferometry in synchrotron radiation field[J]. Optics and precision engineering, 2016, 24(10): 2357-2369. DOI： 10.3788/OPE.20162410.2357.

摘要

针对同步辐射领域光学元件的口径逐渐增大，其面形测量精度的要求已达到纳弧度级的问题，本文研究了该领域先进的面形测量方法——拼接干涉技术，以实现光学元件的高分辨率二维测量。介绍了拼接干涉技术的基本原理，综述了目前同步辐射光学领域常用的面形测量设备——激光光束长程面形仪、高精度自准直纳米测量仪，以及拼接干涉仪的发展历程和特点，比较了它们各自的缺点和优势。最后，分析了拼接干涉涉及的主要误差来源，指出该技术的应用和发展趋势主要有拼接算法的创新，干涉仪测量的快速化，拼接干涉仪的商业化，以及拼接干涉技术与其他科学技术的融合等。

Abstract

In synchrotron radiation field

the apertures of optical components increase gradually and their surface figure precisions have been demanded to be a nano-radian level. This paper researches the modern surface figure measurement methods in this field

stitching interferometry

to realize the high resolution two-dimensional measurement of optical components. The basic principles of the stitching interferometry are introduced. Then

a series of common optical surface shape measurement instruments in the synchrotron radiation field are overviewed

such as long trace profilers based on laser beams

high precision and auto-collimation measuring machines for nanometer optical components and stitching interferometers. It describes their development history and working characteristics and compares their shortcomings and advantages. Finally

this paper analyzes the main error sources involved in the stitching interferometry

and points out that the application and development trends of the technology are mainly the innovation of the stitching algorithm

the improvement of measuring speeds of interferometers

the commercialization of interferometers and the integration of the interferometry and other science technologies.

关键词

Keywords

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