铁铝阻抗匹配靶的精密扩散连接

杨蒙生; 邢丕峰; 魏成富; 唐杰; 李朝阳

doi:10.3788/OPE.20162411.2738

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铁铝阻抗匹配靶的精密扩散连接

微纳技术与精密机械 | 更新时间：2020-07-07

- 铁铝阻抗匹配靶的精密扩散连接
- Precision diffusion bonding of iron-aluminum impedance match target
- 光学精密工程 2016年24卷第11期页码：2738-2745
- 作者机构：
  
  1.中国工程物理研究院激光聚变研究中心, 四川绵阳 621900
  2.绵阳师范学院, 四川绵阳 621000
- 作者简介：
  
  [ "杨蒙生(1973-),男,重庆巴县人,硕士,助理研究员,2007年于北京机械工业学院获得硕士学位,主要从事微靶制备及参数测量方面的研究。E-mail:yangmengsheng@126.com" ]
  邢丕峰(1963-),男,山东冠县人,博士,研究员,博士生导师,1987年于中国科学院青海盐湖研究所获得硕士学位,1996年于中国工程物理研究院研究生部获得博士学位,主要从事微靶制备方面的研究。E-mail:fascist000@yahoo.com.cnE-mail:fascist000@yahoo.com.cn
- 基金信息：
  
  中国工程物理研究院超精密加工技术重点实验室开放基金资助项目(KF13003)
- DOI：10.3788/OPE.20162411.2738
  中图分类号： O484
- 收稿日期：2016-02-05，
  
  录用日期：2016-4-10，
  
  纸质出版日期：2016-11-25
- 稿件说明：
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杨蒙生, 邢丕峰, 魏成富, 等. 铁铝阻抗匹配靶的精密扩散连接[J]. 光学精密工程, 2016,24(11):2738-2745.

Meng-sheng YANG, Pi-feng XING, Cheng-fu WEI, et al. Precision diffusion bonding of iron-aluminum impedance match target[J]. Editorial office of optics and precision engineeri, 2016, 24(11): 2738-2745.
杨蒙生, 邢丕峰, 魏成富, 等. 铁铝阻抗匹配靶的精密扩散连接[J]. 光学精密工程, 2016,24(11):2738-2745. DOI： 10.3788/OPE.20162411.2738.

Meng-sheng YANG, Pi-feng XING, Cheng-fu WEI, et al. Precision diffusion bonding of iron-aluminum impedance match target[J]. Editorial office of optics and precision engineeri, 2016, 24(11): 2738-2745. DOI： 10.3788/OPE.20162411.2738.

摘要

为了获得某些材料在在高压条件下的物态方程，制备了用于激光驱动状态方程实验的铁铝阻抗匹配靶，研究了铁铝薄膜的精密热扩散连接技术。以冷轧铁薄膜和超精密加工铝薄膜为原料，研究了热复合工艺条件对其表面形貌、结晶性能、连接界面等参数的影响。利用白光干涉共焦显微镜、X射线衍射仪、膜厚测量仪、扫描电镜等仪器对靶件的表面形貌、厚度、结晶特性、残余应力及界面成分分布等进行分析表征，掌握了相关参数的变化趋势。据此优化工艺参数，制备了高质量的铁-铝阻抗匹配靶。对成靶的测试结果显示，其表面粗糙度小于100 nm、厚度一致性控制在100 nm以内、界面扩散层厚度约为200 nm，且未观测到显微缺陷，满足物理实验的具体要求。

Abstract

To obtain the state equations of some materials at a high pressure

an iron-aluminum impedance match target for the experimental researches on the state equation of laser driving was prepared and the bonding technology of iron and aluminum films was studied. Both the cold rolled iron film and ultra-precision matching aluminum film were used as raw materials in this work

and the dependences of sample topography

thickness

crystallization properties and interfacial characteristics on process conditions were also researched. A white light interferometer

a scan electron microscope(SEM) and an X-ray diffractometer(XRD) were employed to further reveal the revolution rules of the above parameters and to hold the changing trend of these parameters. Based on the optimized processing conditions

a higher quality target without micro-defect was prepared successfully

and its roughness is less than 100 nm

thickness uniformity is lower than 100 nm and the diffusion layer thickness is about 200 nm. These excellent physical properties verify that the final target significantly meets the requirements of state equation of experiments.

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Keywords

references

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