高性能光学合成石英玻璃的制备和应用

聂兰舰; 王玉芬; 向在奎; 王蕾; 王慧

doi:10.3788/OPE.20162412.2916

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高性能光学合成石英玻璃的制备和应用

高功率激光光学元器件 | 更新时间：2020-08-13

- 高性能光学合成石英玻璃的制备和应用
- Preparation and application of high-performance synthetic optical fused silica glass
- 光学精密工程 2016年24卷第12期页码：2916-2924
- 作者机构：
  
  中国建筑材料科学研究总院石英与特种玻璃研究院, 北京 100024
- 作者简介：
  
  聂兰舰(1985-), 男, 江西赣州人, 博士研究生, 工程师, 2008年于济南大学获得学士学位, 2011年于中国建筑材料科学研究总院获得硕士学位, 主要从事高性能光学石英玻璃基础理论与工艺技术方面的研究。E-mail:jnnlj@163.com NIE Lan-jian, E-mail:jnnlj@163.com
  [ "王玉芬(1964-), 女, 河北遵化人, 教授, 1986年于华东化工学院(现华东理工大学)获得学士学位, 2005年于北京工业大学获得硕士学位, 主要从事高性能光学石英玻璃基础理论与工艺技术方面的研究。E-mail:wangyufen@cbmamail.com.cn" ]
- 基金信息：
  
  国家国际科技合作专项资助项目(2012DFA51310);中国建筑材料科学研究总院前沿探索基金资助项目(YT-112)
- DOI：10.3788/OPE.20162412.2916
  中图分类号： TQ171.731
- 收稿日期：2016-10-12，
  
  录用日期：2016-12-2，
  
  纸质出版日期：2016-12-25
- 稿件说明：
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聂兰舰, 王玉芬, 向在奎, 等. 高性能光学合成石英玻璃的制备和应用[J]. 光学精密工程, 2016,24(12):2916-2924.

Lan-jian NIE, Yu-fen WANG, Zai-kui XIANG, et al. Preparation and application of high-performance synthetic optical fused silica glass[J]. Optics and precision engineering, 2016, 24(12): 2916-2924.
聂兰舰, 王玉芬, 向在奎, 等. 高性能光学合成石英玻璃的制备和应用[J]. 光学精密工程, 2016,24(12):2916-2924. DOI： 10.3788/OPE.20162412.2916.

Lan-jian NIE, Yu-fen WANG, Zai-kui XIANG, et al. Preparation and application of high-performance synthetic optical fused silica glass[J]. Optics and precision engineering, 2016, 24(12): 2916-2924. DOI： 10.3788/OPE.20162412.2916.

摘要

介绍了制备光学合成石英玻璃的常用工艺方法，包括化学气相沉积、等离子化学气相沉积和间接合成法等；给出了不同光学石英玻璃使用的原材料、它们的特点及其在不同领域的应用综述了该项技术在国内外的发展现状。比较了上述制备方法的优缺点，其中立式化学气相沉积工艺是目前最成熟的商业化工艺，可用于制备直径达

600 mm以上、光学均匀性优于2×10

-6

、抗激光损伤阈值达30 J/cm

@355 nm的大尺寸合成石英玻璃；等离子化学气相沉积工艺可制备内在质量优异、羟基含量≤5×10

-6

、光谱透过率

190-4000 nm

≥80%的全光谱透过石英玻璃；间接合成法可制备光吸收系数小于1×10

-6

/cm@1064 nm、羟基含量≤1×10

-6

、光谱透过率

157-4000 nm

≥80%的石英玻璃，而且易于掺杂及控制缺陷，进而制备各类掺杂特殊功能的石英玻璃。文章最后指出：上述制备工艺各有优缺点，应根据高端光电技术领域的应用需求采取适当的制备工艺。

Abstract

Several kinds of important preparation processes of synthetic optical silica glass are elaborated

such as Chemical Vapor Deposition (CVD)

Plasma Chemical Vapor Deposition (PCVD) and indirect synthetic method. The raw materials and characteristics for the optical silica glass

as well their applications in different fields are given. Then

developing situations and tendencies of these preparation processes are reviewed. It compares their advantages and shortcomings in detail. Among them

the CVD is the most mature and commercial technology. It prepares the synthetic silica glass with a diameter of 600 mm or beyond

its optical uniformity is better than 2×10

-6

and the laser damage threshold is 30 J/cm

@355 nm. The PCVD processes synthetic silica glass of full-spectrum transmittance. It shows excellent internal quality

its hydroxyl content is less than 5×10

-6

and the spectral transmittance of

190-4000 nm

is more than 80%. Furthermore

the indirect synthetic method prepares the synthetic silica glass with an absorption coefficient less than 1×10

-6

/cm@1064 nm

its hydroxyl content is less than 1×10

-6

and the spectral transmittance of

157-4000 nm

is more than 80%. Moreover

the indirect synthetic method is beneficial to doping and controlling the defects of synthetic silica glass

which achieves all kinds of special functional silica glass. It suggests that each of these preparation processes of synthetic optical silica glass has its own advantages and disadvantages

so proper preparation processes could be adopted for different application requirements of modern high-end photoelectron technological fields.

关键词

Keywords

references

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