磁流变抛光对熔石英激光损伤特性的影响

石峰; 万稳; 戴一帆; 彭小强

doi:10.3788/OPE.20162412.2931

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磁流变抛光对熔石英激光损伤特性的影响

高功率激光光学元器件 | 更新时间：2020-08-13

- 磁流变抛光对熔石英激光损伤特性的影响
- Effect of magnetorheological finishing on laser damage properties of fused silica
- 光学精密工程 2016年24卷第12期页码：2931-2937
- 作者机构：
  
  国防科技大学机电工程与自动化学院湖南超精密加工技术重点实验室, 湖南长沙 410073
- 作者简介：
  
  [ "石峰(1980-), 男, 辽宁朝阳人, 副研究员, 主要从事光学精密工程与计算机控制、磁流变抛光技术、强光光学元件损伤动力学等方面的研究。E-mail:sf.wind@yahoo.com" ]
  万稳(1988-), 男, 湖北随州人, 博士研究生, 主要研究方向为强光光学元件低污染高阈值工艺。E-mail:wan653234903@126.com WAN Wen, E-mail:wan653234903@126.com
- 基金信息：
  
  国家自然科学基金资助项目(51675526);国家自然科学基金重大研究计划集成项目(91323302);国家自然科学基金资助项目(51275521)
- DOI：10.3788/OPE.20162412.2931
  中图分类号： TN305.2;TQ171.731
- 收稿日期：2016-11-17，
  
  录用日期：2016-11-24，
  
  纸质出版日期：2016-12-25
- 稿件说明：
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石峰, 万稳, 戴一帆, 等. 磁流变抛光对熔石英激光损伤特性的影响[J]. 光学精密工程, 2016,24(12):2931-2937.

Feng SHI, Wen WAN, Yi-fan DAI, et al. Effect of magnetorheological finishing on laser damage properties of fused silica[J]. Optics and precision engineering, 2016, 24(12): 2931-2937.
石峰, 万稳, 戴一帆, 等. 磁流变抛光对熔石英激光损伤特性的影响[J]. 光学精密工程, 2016,24(12):2931-2937. DOI： 10.3788/OPE.20162412.2931.

Feng SHI, Wen WAN, Yi-fan DAI, et al. Effect of magnetorheological finishing on laser damage properties of fused silica[J]. Optics and precision engineering, 2016, 24(12): 2931-2937. DOI： 10.3788/OPE.20162412.2931.

摘要

为进一步提升熔石英元件的激光损伤阈值，研究了氢氟酸（HF）动态酸刻蚀条件下磁流变抛光工艺对熔石英元件激光损伤特性的影响规律。首先，采用不同工艺制备熔石英元件，测量它们的表面粗糙度。然后，采用飞行时间-二次离子质谱法（OF-SIMS）检测磁流变加工前后熔石英元件中金属杂质元素的含量和深度；采用1-on-1方法测试激光损伤阈值，观测损伤形貌，并对损伤坑的形态进行统计。最后，分析了磁流变抛光工艺提升熔石英损伤阈值的原因。与未经磁流变处理的熔石英元件进行了对比，结果显示：磁流变抛光使熔石英元件的零概率激光损伤阈值提升了23.3%，金属杂质元素含量也显著降低，尤其是对熔石英激光损伤特性有重要影响的Ce元素被完全消除。得到的结果表明，磁流变抛光工艺能够被用作HF酸动态酸刻蚀的前道处理工艺。

Abstract

To further increase the laser-induced damage threshold of the fused silica elements

the effect of Magnetorheological Finishing (MRF) technology on the laser damage properties of fused silica elements was investigated under the condition of Hydrogen Fluoride (HF) acid dynamic etching process. Firstly

the fused silica samples were prepared by different processes and their surface roughnesses were measured. Then

the contents and depths of metal impurity elements before and after MRF processing were measured by Time of Flight-Secondary Ion Mass Spectroscopy (TOF-SIMS). The damage threshold was measured by 1-on-1 test method

and the damage morphology was observed and statistically analyzed. Finally

the reasons of increasing the laser-induced damage threshold of the fused silica by the MRF were analyzed. The experimental results were compared with that of the fused silica without the MRF. It shows that the MRF can increase the laser damage threshold of fused silica by 23.3%. Moreover

the content of metal impurity elements is significantly reduced

especially the Ce element which has a significant impact on the laser damage performance of fused silica is completely eliminated. It concludes that the MRF process can be used as a pre-treatment process for HF acid dynamic etching process.

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references

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