光学元件改性处理对激光损伤阈值的影响

袁志刚; 李亚国; 陈贤华; 徐曦; 赵世杰; 周炼

doi:10.3788/OPE.20162412.2956

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光学元件改性处理对激光损伤阈值的影响

高功率激光光学元器件 | 更新时间：2020-08-13

- 光学元件改性处理对激光损伤阈值的影响
- Effect of chemical modification technology laser damage threshold of fused silica optical elements
- 光学精密工程 2016年24卷第12期页码：2956-2961
- 作者机构：
  
  成都精密光学工程研究中心, 四川成都 610041
- 作者简介：
  
  袁志刚(1985-), 男, 河北衡水人, 工程师, 2008年于武汉大学获得学士学位, 主要从事光学元件精密加工制造技术及损伤能力提升等方面的研究。E-mail:yuanzhigang23@163.com YUAN Zhi-gang, E-mail:yuanzhigang23@163.com
  [ "李亚国(1983-), 男, 陕西咸阳人, 博士, 高级工程师, 2005年于复旦大学获学士学位, 2014年于日本秋田县立大学获博士学位, 主要从事光学制造, 精密加工及激光损伤等方面的研究。E-mail:yargolee@163.com" ]
- 基金信息：
  
  国家自然科学基金资助项目(51505444);中国物理工程研究院科学技术发展基金资助项目(2015B0203032);中国物理工程研究院超精密加工重点实验室科研基金资助项目(K984-15-JCZ)
- DOI：10.3788/OPE.20162412.2956
  中图分类号： TQ171.734;TN305.2
- 收稿日期：2016-11-02，
  
  录用日期：2016-12-7，
  
  纸质出版日期：2016-12-25
- 稿件说明：
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袁志刚, 李亚国, 陈贤华, 等. 光学元件改性处理对激光损伤阈值的影响[J]. 光学精密工程, 2016,24(12):2956-2961.

Zhi-gang YUAN, Ya-guo LI, Xian-hua CHEN, et al. Effect of chemical modification technology laser damage threshold of fused silica optical elements[J]. Optics and precision engineering, 2016, 24(12): 2956-2961.
袁志刚, 李亚国, 陈贤华, 等. 光学元件改性处理对激光损伤阈值的影响[J]. 光学精密工程, 2016,24(12):2956-2961. DOI： 10.3788/OPE.20162412.2956.

Zhi-gang YUAN, Ya-guo LI, Xian-hua CHEN, et al. Effect of chemical modification technology laser damage threshold of fused silica optical elements[J]. Optics and precision engineering, 2016, 24(12): 2956-2961. DOI： 10.3788/OPE.20162412.2956.

摘要

针对355 nm激光作用于熔石英光学元件后其损伤阈值容易变差的问题，提出使用1.7%纯HF溶液和0.4% HF与1.2% NH

F混合的BOE溶液对样品进行处理来提高它们的激光诱导损伤阈值（LIDT）。在相同的条件下将熔石英光学元件浸没到上述两种不同的刻蚀溶液中进行处理，通过测量刻蚀过程中元件重量变化来计算刻蚀速率，利用Zygo轮廓仪测试元件表面粗糙度，然后对355 nm激光照射下熔石英元件的损伤阈值情况进行研究。损伤测试表明，LIDT与元件的材料去除深度有关系，用两种刻蚀液刻蚀去除一定深度后，LIDT均有增加，但是进一步去除会显著地降低元件的LIDT。在处理过程中，这两种刻蚀液的去除速率都很稳定，分别为85.9 nm/min和58.6 nm/min左右。另外，元件表面的粗糙度会随着刻蚀时间的增加而变大。在刻蚀过程中还通过纳米技术测量了熔石英元件表面的硬度及杨氏系数，不过没有证据表明其与激光诱导损伤有明确的关系。

Abstract

The Laser-induced Damage Thresholds (LIDTs) of fused silica optical elements would be deteriorate

when it suffers the 355 nm laser irradiation. This paper proposes a method to improve their LIDTs. A silica element was immersed into two types of HF-based etchants:1.7%wt. HF acid and buffer oxide etchant (BOE:the mixture of 0.4%wt. HF and 12%wt. NH

F) to be treated in the same experimental condition

respectively. The etching rate was calculated by measuring the weight variation of the etching element during the etching process

and the surface roughness of the element was tested by a Zygo contourgraph. Then

the LIDT characteristics of the fused quartz element under the 355 nm laser irradiation were studied. The damage testing shows that the LIDT is relative to the depth of material removal. Both the etchants increase the LIDT at a certain depth of material removal

but further removal of material lowers the LIDT markedly. The etching rates of both etchants keep steady in our processing procedure

they are~85.9 nm/min and~58.6 nm/min

respectively. The micro-surface roughness (RMS

PV) increases as etching time extended. Furthermore

the hardness and Young's modulus of the fused silica etched were measured by a nano-indenter

and there is no solid evidence that LIDT can be related to hardness or Young's modulus.

关键词

Keywords

references

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