用于强激光系统的光栅偏振器

刘全; 吴建宏; 郭培亮

doi:10.3788/OPE.20162412.2962

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用于强激光系统的光栅偏振器

高功率激光光学元器件 | 更新时间：2020-08-13

- 用于强激光系统的光栅偏振器
- Grating polarizers for high power laser systems
- 光学精密工程 2016年24卷第12期页码：2962-2968
- 作者机构：
  
  1.苏州大学物理与光电·能源学部苏州纳米科技协同创新中心, 江苏苏州 215006
  2.苏州大学江苏省先进光学制造技术重点实验室教育部现代光学技术重点实验室, 江苏苏州 215006
- 作者简介：
  
  刘全(1978-), 男, 安徽滁州人, 博士, 副研究员, 2001年于安徽师范大学获得学士学位, 2004年于苏州大学获得硕士学位, 2013年于苏州大学获得博士学位, 主要从事微纳光学、衍射光学、微纳制造技术等方面的研究。E-mail:liuquan@suda.edu.cn LIU Quan, E-mail:liuquan@suda.edu.cn
  [ "吴建宏(1960-), 男, 江苏苏州人, 研究员, 博士生导师, 1982年于苏州大学获得学士学位, 1988年于苏州大学获得硕士学位, 2005年于上海理工大学获得博士学位, 主要从事全息学、光信息处理、全息光学元件等方面的研究。E-mail:jhwu@suda.edu.cn" ]
- 基金信息：
  
  国家自然科学基金资助项目(60907017);上海市全固态激光器与应用技术重点实验室开放课题(2014ADL02)
- DOI：10.3788/OPE.20162412.2962
  中图分类号： O436.1;O436.3
- 收稿日期：2016-09-27，
  
  录用日期：2016-12-5，
  
  纸质出版日期：2016-12-25
- 稿件说明：
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刘全, 吴建宏, 郭培亮. 用于强激光系统的光栅偏振器[J]. 光学精密工程, 2016,24(12):2962-2968.

Quan LIU, Jian-hong WU, Pei-liang GUO. Grating polarizers for high power laser systems[J]. Optics and precision engineering, 2016, 24(12): 2962-2968.
刘全, 吴建宏, 郭培亮. 用于强激光系统的光栅偏振器[J]. 光学精密工程, 2016,24(12):2962-2968. DOI： 10.3788/OPE.20162412.2962.

Quan LIU, Jian-hong WU, Pei-liang GUO. Grating polarizers for high power laser systems[J]. Optics and precision engineering, 2016, 24(12): 2962-2968. DOI： 10.3788/OPE.20162412.2962.

摘要

针对强激光系统中常用的1 053 nm激光器进行了偏振光栅结构的优化设计。利用严格耦合波理论分析了光栅偏振器的衍射特性及消光比，分析显示偏振光栅周期为600 nm，占宽比为0.535~0.55，槽形深度为1 395 nm~1 420 nm时，可保证其在1 053 nm波长下，透射率高于95%，消光比大于1 500。基于分析结果，利用全息光刻技术制作了高质量光刻胶光栅掩模，并采用倾斜转动的离子束刻蚀结合反应离子束刻蚀的方法对该光刻胶光栅掩模进行图形转移，制作了底部占宽比为0.54，槽形深度为1 400 nm的光栅偏振器。实验测量显示其透射率为92.9%，消光比达到160。与其他制作光栅偏振器方法相比，采用单光刻胶光栅掩模结合倾斜转动的离子束刻蚀工艺，不但简化了制作工艺，而且具有激光损伤阈值高、成本低的优点。由于该技术可制作大面积光栅，特别利于在强激光系统中应用。

Abstract

The structure of a grating polarizer in common 1053 nm lasers was optimized for high power laser systems. The diffraction characteristics and extinction ratio of the grating polarizer were investigated by using rigorous coupled-wave theory. The results show when the grating period

duty cycle and the groove depth of the grating are 600 nm

0.535-0.55 and 1 395-1 420 nm at a wavelength of 1053 nm

respectively

the extinction ratio could be more than 1500

and the optical transmittance of the TM-polarized wave could be over 95%. Based on the above analysis

a high quality photoresist grating mask was made by holographic lithography. Then

it was transferred to the fused silica substrate by tilted rotating ion beam etching and reactive ion beam etching to fabricate a grating polarizer with the period of 600 nm

bottom duty cycle of 0.54 and the groove depth 1 400 nm. Experimental measurements on the grating polarizer show that the optical transmittance is 92.9% and the extinction ratio is 160. Compared with other fabricating methods for the grating polarizer

the proposed method only requires a single layer of photoresist grating mask

which simplifies the fabricating process

enjoys low costs and guarantees the high damage threshold of the grating. As the method can fabricate large scale gratings

it is suitable for applications to the high power laser systems.

关键词

Keywords

references

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